Abstract
Cross-sectional investigation is an important method to study ion irradiation effects in the depth direction. In this study, 2 MeV H+ was implanted in 6H-SiC single crystals to investigate the effects of light ion irradiation on SiC. Raman spectroscopy and scanning electronic microscopy (SEM) were carried out on cross-sectional samples to reveal the in-depth damage states and dopant behavior. The most damaged region is a little shallower than that predicted by the SRIM procedure, owing to the uncertainty in SRIM simulations. Layered structures representing zones of varying damage after 2 MeV H ion irradiation are clearly observed. Two bands are observed in SEM images, of which on band corresponds to the damage peak, while the other band at the end of the H ion-affected area is probably a result of H diffusion propelled by a hydrogen-rich layer during irradiation. A charge accumulation effect related with conductivity on the sample surfaces during SEM tests is observed in the H-implanted area. A model is proposed to explain these phenomena.
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References
J.B. Casady, R.W. Johnson, Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: a review. Solid State Electron. 39, 1409–1422 (1996). https://doi.org/10.1016/0038-1101(96)00045-7
C. Raynaud, Silica films on silicon carbide: a review of electrical properties and device applications. J. Non-Cryst. Solids 280, 1–31 (2001). https://doi.org/10.1016/s0022-3093(00)00350-1
A.A. Lebedev, A.I. VeÏnger, D.V. Davydov et al., Radiation defects in n-4H-SiC irradiated with 8-MeV protons. Semiconductors 34, 1016–1020 (2000). https://doi.org/10.1134/1.1309411
N.B. Strokan, A.M. Ivanov, N.S. Savkina et al., Radiation resistance of transistor-and diode-type SiC detectors irradiated with 8-MeV protons. Semiconductors 38, 807–811 (2004). https://doi.org/10.1134/1.1777605
G. Alfieri, E.V. Monakhov, B.G. Svensson, Defect energy levels in hydrogen-implanted and electron-irradiated n-type 4H silicon carbide. J. Appl. Phys. 98, 113524 (2005). https://doi.org/10.1063/1.2139831
H.J. von Bardeleben, J.L. Cantin, I. Vickridge, Proton-implantation-induced defects in n-type 6 H-and 4 H-SiC: an electron paramagnetic resonance study. Phys. Rev. B. 62, 10126 (2000). https://doi.org/10.1103/PhysRevB.62.10126
Y. Han, B.S. Li, Z.G. Wang et al., H-ion irradiation-induced annealing in He-ion implanted 4H-SiC. Chin. Phys. Lett. 34, 012801 (2017). https://doi.org/10.1088/0256-307X/34/1/012801
N.B. Strokan, A.M. Ivanov, A.A. Lebedev, Transport of the charge carriers in SiC-detector structures after extreme radiation fluences. Nucl. Instrum. Meth. A. 569, 758–763 (2006). https://doi.org/10.1016/j.nima.2006.08.077
H.J. von Bardeleben, J.L. Cantin, Electron paramagnetic resonance study of proton implantation induced defects in monocrystalline 4H- and 6H-SiC. Nucl. Instrum. Meth. B 186, 201–205 (2002). https://doi.org/10.1016/S0168-583X(01)00884-9
A.A. Lebedev, B.Ya. Ber, G.A. Oganesyan et al., Effect of 3C-SiC irradiation with 8 MeV protons. Mater. Sci. Forum 897, 311–314 (2017). https://doi.org/10.4028/www.scientific.net/MSF.897.311
N. Achtziger, J. Gillenberger, W. Witthuhn et al., Hydrogen passivation of silicon carbide by low-energy ion implantation. Appl. Phys. Lett. 73, 945 (1998). https://doi.org/10.1063/1.122047
M.K. Linnarsson, J.P. Doyle, B.G. Svensson, Diffusion of hydrogen in 6H silicon carbide. Mater. Res. Soc. Symp. Proc. 423, 625 (1996). https://doi.org/10.1557/PROC-423-62
J.F. Ziegler, J.P. Biersack, U. Littmarck, The Stopping and Range of Ions in Solids (Pergamon Press, New York, 1985)
H.Y. Kim, J. Kim, J.A. Freitas Jr., Penetration depth profiling of proton-irradiated 4H-SiC at 6 MeV and 8 MeV by micro-Raman spectroscopy. Appl. Surf. Sci. 270, 44–48 (2013). https://doi.org/10.1016/j.apsusc.2012.12.014
X. Wang, Y.W. Zhang, S.Y. Liu et al., Depth profiling by Raman spectroscopy of high-energy ion irradiated silicon carbide. Nucl. Instrum. Meth. B 319, 55–61 (2014). https://doi.org/10.1016/j.nimb.2013.10.017
G. Guimbretière, L. Desgranges, A. Canizarès et al., Determination of in-depth damaged profile by Raman line scan in a pre-cut He2+ irradiated UO2. Appl. Phys. Lett. 100, 251914 (2012). https://doi.org/10.1063/1.4729588
S. Miro, G. Velisa, L. Thomé et al., Monitoring by Raman spectroscopy of the damage induced in the wake of energetic ions. J. Raman Spectrosc. 45, 481–486 (2014). https://doi.org/10.1002/jrs.4482
K. Huang, Q. Jia, T.G. You et al., Defect formation in MeV H+ implanted GaN and 4H-SiC investigated by cross-sectional Raman spectroscopy. Nucl. Instrum. Meth. B. Article in press (2017). https://doi.org/10.1016/j.nimb.2017.02.027
R. Devanathan, W.J. Weber, Displacement energy surface in 3C and 6H-SiC. J. Nucl. Mater. 278, 258–265 (2000). https://doi.org/10.1016/S0022-3115(99)00266-4
S. Sorieul, J.M. Costantini, L. Gosmain et al., Raman spectroscopy study of heavy-ion-irradiated α-SiC. J. Phys.: Condens. Matter 18, 5235–5251 (2006). https://doi.org/10.1088/0953-8984/18/22/022
J. Lindhard, V. Nielsen, M. Scharff, Approximation method in classical scattering by screened coulomb fields. Matemat. Fysis. Meddel. 36, 1–32 (1968)
H.Z. Xue, Y. Zhang, Z. Zhu et al., Damage profiles and ion distribution in Pt-irradiated SiC. Nucl. Instrum. Meth. B 286, 114–118 (2012). https://doi.org/10.1016/j.nimb.2012.02.014
Y. Zhang, I.T. Bae, K. Sun et al., Damage profile and ion distribution of slow heavy ions in compounds. J. Appl. Phys. 105, 104901 (2009). https://doi.org/10.1063/1.3118582
K. Jin, Y. Zhang, H. Xue et al., Ion distribution and electronic stopping power for Au ions in silicon carbide. Nucl. Instrum. Meth. B 307, 65–70 (2013). https://doi.org/10.1016/j.nimb.2013.02.051
C. Lan, J.M. Xue, Y. Zhang et al., Molecular dynamics simulations of ion range profiles for heavy ions in light targets. Nucl. Instrum. Meth. B 286, 45–60 (2012). https://doi.org/10.1016/j.nimb.2012.01.020
S. Moll, Y. Zhang, Z. Zhu et al., Comparison between simulated and experimental Au-ion profiles implanted in nanocrystalline ceria. Nucl. Instrum. Meth. B 307, 93–97 (2013). https://doi.org/10.1016/j.nimb.2012.12.119
Y. Zhang, W.J. Weber, Electronic stopping of He, B, N, and Al in SiC. Appl. Phys. Lett. 83, 1665 (2003). https://doi.org/10.1063/1.1604473
Y. Zhang, W. Weber, C. Wang, Electronic stopping powers in silicon carbide. Phys. Rev. B. 69, 205201 (2004). https://doi.org/10.1103/PhysRevB.69.205201
J.F. Ziegler, J.M. Manoyan, The stopping of ions in compounds. Nucl. Instrum. Meth. B 35, 215–228 (1988). https://doi.org/10.1016/0168-583X(88)90273-X
Y. Zhang, T. Varga, M. Ishimaru et al., Competing effects of electronic and nuclear energy loss on microstructural evolution in ionic-covalent materials. Nucl. Instrum. Meth. B 327, 33–43 (2014). https://doi.org/10.1016/j.nimb.2013.10.095
W.J. Weber, D.M. Duffy, L. Thomé, Y. Zhang, The role of electronic energy loss in ion beam modification of materials. Curr. Opin. Solid State Mater. Sci. 19, 1–11 (2015). https://doi.org/10.1016/j.cossms.2014.09.003
L. Thomé, A. Debelle, F. Garrido et al., Combined effects of nuclear and electronic energy losses in solids irradiated with a dual-ion beam. Appl. Phys. Lett. 102, 141906 (2013). https://doi.org/10.1063/1.4801518
M.K. Linnarsson, M.S. Janson, S. Karlsson et al., Diffusion of light elements in 4H- and 6H-SiC. Mater. Sci. Eng., B 61, 275–280 (1999). https://doi.org/10.1016/S0921-5107(98)00517-0
A. Barcz, M. Kozubal, R. Jakieła et al., Diffusion and impurity segregation in hydrogen-implanted silicon carbide. J. Appl. Phys. 115, 223710 (2014). https://doi.org/10.1063/1.4882996
K.H. Kim, Z. Akase, T. Suzuki et al., Charging effects on SEM/SIM contrast of metal/insulator system in various metallic coating conditions. Mater. Trans. 51, 1080–1083 (2010). https://doi.org/10.2320/matertrans.M2010034
J.G. Laven, H.J. Schulze, V. Haublein et al., Dopant profiles in silicon created by MeV hydrogen implantation: influence of annealing parameters. Phys. Status Solidi C 8, 697–700 (2011). https://doi.org/10.1002/pssc.201000161
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This work was supported by the National Natural Science Foundation of China (Grant Nos. 11705169, 91426304 and 91226202).
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Wang, X., Zhang, YW., Han, D. et al. Cross-sectional investigation of radiation damage of 2 MeV proton-irradiated silicon carbide. NUCL SCI TECH 29, 57 (2018). https://doi.org/10.1007/s41365-018-0386-0
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DOI: https://doi.org/10.1007/s41365-018-0386-0