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Evaporation-induced morphology pattern of triblock copolymer A5B10C5 in thin film: A multibody DPD simulation study

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Abstract

We used multibody dissipative particle dynamics method, by which the attractive and repulsive interactions can be effectively considered, to investigate the evaporation-induced morphology patterns of triblock copolymer A5B10C5 in thin film. With changing attractive interactions between solvent vapor and triblock copolymer that represent various selective solvents, lamellar morphology, sandwich lamellar morphology, spherical morphology and disorder morphology patterns of the thin films were obtained for both coil-coil-coil and rod-coil-coil chain architectures, respectively. The order parameter and the film thickness were calculated during the process for characterizing the film properties, and it was found that the rigid A-block of the triblock copolymer hinders the formation of an ordered structure.

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Authors and Affiliations

  1. State Key Laboratory of Theoretical and Computational Chemistry, Institute of Theoretical Chemistry, Jilin University, Changchun, 130021, P. R. China

    Yang Li, Dequan Wang, Wei Wang, Yanchun Li, Xuri Huang & Chiachung Sun

  2. Institute of Atomic and Molecular Physics, Jilin University, Changchun, 130012, P. R. China

    Yanchun Li & Mingxing Jin

Authors
  1. Yang Li
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  2. Dequan Wang
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  3. Wei Wang
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  4. Yanchun Li
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  5. Xuri Huang
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  6. Chiachung Sun
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  7. Mingxing Jin
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Correspondence to Yanchun Li.

Additional information

Supported by the National Natural Science Foundation of China(Nos.21103064, 21173097, 21073075) and the Basic Research Fund of Jilin University, China(Nos.450060481158, 450060491249).

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Li, Y., Wang, D., Wang, W. et al. Evaporation-induced morphology pattern of triblock copolymer A5B10C5 in thin film: A multibody DPD simulation study. Chem. Res. Chin. Univ. 30, 144–148 (2014). https://doi.org/10.1007/s40242-013-3260-y

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  • DOI: https://doi.org/10.1007/s40242-013-3260-y

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