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Characterization and wettability of ZnO film prepared by chemical etching method

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Abstract

ZnO thin films were prepared by a chemical etching method and their wettability was investigated. The structure and surface composition structure were characterized by means of scanning electron microscopy, X-ray photoelectronic spectrometry(XPS), X-ray diffraction(XRD) and Raman spectrometry. These analyses reveal that the etched films were large-scale micro-nanohierarchical structures composed of a Zn core and a ZnO coating. Superhydrophobic surfaces with water contact angles of over 150° were obtained by n-octadecanethiol(ODT) modification. The XPS and Raman results indicate that ODT molecules were bound to the ZnO surface with the S head group by forming Zn—S bond.

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Authors and Affiliations

  1. Key Laboratory of Bionic Engineering, Ministry of Education, Jilin University, Changchun, 130025, P. R. China

    Hua-xi Guo, Hui-ying Jia, Jian-bo Zeng, Qian Cong & Lu-quan Ren

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  1. Hua-xi Guo
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  2. Hui-ying Jia
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  3. Jian-bo Zeng
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  4. Qian Cong
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  5. Lu-quan Ren
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Corresponding author

Correspondence to Qian Cong.

Additional information

Supported by the National Natural Science Foundation of China(No.50875108) and the Specialized Research Fund for the Doctoral Program of Higher Education of China(No.20100061110022).

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Guo, Hx., Jia, Hy., Zeng, Jb. et al. Characterization and wettability of ZnO film prepared by chemical etching method. Chem. Res. Chin. Univ. 29, 333–337 (2013). https://doi.org/10.1007/s40242-013-2181-0

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  • DOI: https://doi.org/10.1007/s40242-013-2181-0

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