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A high entropy silicide by reactive spark plasma sintering


A high-entropy silicide (HES), (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 °C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive spectrometer analysis except a small amount of zirconium that is combined with oxygen as impurity particles. The Young’s modulus, Poisson’s ratio, and Vickers hardness of the obtained (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si2 are also measured.


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Financial support from the National Natural Science Foundation of China (Nos. 51532009 and 51872045), and the Science and Technology Commission of Shanghai Municipality (No. 18ZR1401400) are gratefully acknow-ledged.

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Correspondence to Guo-Jun Zhang.

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Qin, Y., Liu, JX., Li, F. et al. A high entropy silicide by reactive spark plasma sintering. J Adv Ceram 8, 148–152 (2019).

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  • high-entropy ceramics
  • high-entropy silicide
  • spark plasma sintering
  • silicide