Skip to main content
Log in

Dependence of the sputtering pressure on the characteristics of sputtered ZnO:Al thin films

  • Original Paper - Condensed Matter
  • Published:
Journal of the Korean Physical Society Aims and scope Submit manuscript

Abstract

Transparent and conductive ZnO:Al (AZO) films were prepared by using RF magnetron sputtering at room temperature. The dependence of the sputtering pressure on the electrical, structural, and optical characteristics of the AZO thin films was analyzed. Lower sputtering pressure leads to low film resistivity owing to higher mobility and carrier concentration. This result is affected by the increment of the kinetic energy of the sputtered atoms and the decrement of the specific species, resulting in a rise in the Al content and the grain size and in a shrinkage of the surface bonding. The average transmittance of all films at visible wavelengths was above 85%. Therefore, the control of sputtering pressure performs a critical function in determining the characteristics of AZO samples and is a helpful process for acquiring films with superior characteristics.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6

Similar content being viewed by others

References

  1. Y. Liu, H. Wang, Y. Zhang, C. Chen, X. Chen, Y. Duan, Appl. Surf. Sci. 504, 144442 (2020)

    Article  Google Scholar 

  2. A.A. Galil, M.S.A. Hussien, L.S. Yahia, Superlattice Microst. 147, 106697 (2020)

    Article  Google Scholar 

  3. J.H. Park, H.J. Seok, S.H. Jung, H.K. Cho, H.K. Kim, Ceram. Int. 47, 3149 (2021)

    Article  Google Scholar 

  4. T. Minami, Thin Solid Films 516, 5822 (2008)

    Article  ADS  Google Scholar 

  5. S.J. Pearton, D.P. Norton, K. Ip, Y.W. Heo, T. Steiner, Prog. Mater. Sci. 50, 293 (2005)

    Article  Google Scholar 

  6. T. Zhang, Z. Xu, J. Chen, M. Li, Y. Lu, Y. He, J. Alloys Compd. 833, 155032 (2020)

    Article  Google Scholar 

  7. B.L. Zhu, J.M. Ma, K. Lv, C.J. Wang, J. Wu, Z.H. Gan, J. Liu, X.W. Shi, Superlattice Microst. 140, 106456 (2020)

    Article  Google Scholar 

  8. G.B. Lee, S.H. Song, M.W. Lee, Y.J. Kim, B.H. Choi, Appl. Surf. Sci. 535, 147731 (2021)

    Article  Google Scholar 

  9. S. Swann, Phys. Technol. 19, 67 (1988)

    Article  ADS  Google Scholar 

  10. Y.M. Chung, C.S. Moon, M.J. Jung, J.G. Han, Surf. Coat. Technol. 200, 936 (2005)

    Article  Google Scholar 

  11. O. Kluth, G. Schoepe, This Solid Films 442, 80 (2003)

    Article  ADS  Google Scholar 

  12. A. Van der Drift, Philips Res. Rep. 22, 267 (1967)

    Google Scholar 

  13. X.T. Hao, L.W. Tan, K.S. Ong, F. Zhu, J. Cryst. Growth 287, 44 (2006)

    Article  ADS  Google Scholar 

  14. J.P. Kim, J.S. Bae, T.E. Hong, M.S. Won, J.H. Yoon, B.S. Lee, H.J. Lee, Thin Solid Films 518, 6179 (2010)

    Article  ADS  Google Scholar 

  15. B.D. Cullity, Elements of X-ray Diffraction (Addison-Wesley, Reading, MA, 1978)

    Google Scholar 

  16. N.S. Ramgir, I.S. Mulla, V.K. Pillai, J. Phys. Chem. B 110, 3995 (2006)

    Article  Google Scholar 

  17. J.C. Fan, J.B. Goodenough, J. Appl. Phy. 48, 3524 (1977)

    Article  ADS  Google Scholar 

  18. N.S. Ramgir, D.J. Late, A.B. Bhise, M.A. More, I.S. Mulla, D.S. Joag, K. Vijayamohanan, J. Phys. Chem. B 110, 18236 (2006)

    Article  Google Scholar 

  19. B.D. Ahn, S.H. Oh, C.H. Lee, G.H. Kim, H.J. Kim, S.Y. Lee, J. Cryst. Growth 309, 128 (2007)

    Article  ADS  Google Scholar 

  20. F.H. Hsu, N.F. Wang, Y.Z. Tsai, M.C. Chuang, Y.S. Cheng, M.P. Houng, Appl. Surf. Sci. 280, 104 (2013)

    Article  ADS  Google Scholar 

  21. K.C. Park, D.Y. Ma, K.H. Kim, Thin Solid Films 305, 201 (1997)

    Article  ADS  Google Scholar 

  22. J. Tauc, Mater. Res. Bull 5, 721 (1970)

    Article  Google Scholar 

  23. H.R. Fallah, M. Ghasemi, A. Hassanzadeh, H. Steki, Mater. Res. Bull. 42, 487 (2007)

    Article  Google Scholar 

  24. L. Burstein, Phys. Rev. 93, 632 (1954)

    Article  ADS  Google Scholar 

  25. T.S. Moss, Proc. Phys. Soc. Lond. Set. A 382, 775 (1954)

    Article  ADS  Google Scholar 

Download references

Acknowledgements

This paper was supported by Wonkwang University in 2021.

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Deok Kyu Kim.

Additional information

Publisher's Note

Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Kim, D.K. Dependence of the sputtering pressure on the characteristics of sputtered ZnO:Al thin films. J. Korean Phys. Soc. 80, 410–414 (2022). https://doi.org/10.1007/s40042-022-00418-w

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s40042-022-00418-w

Keywords

Navigation