Characterization of polycrystalline nickel cobaltite nanostructures prepared by DC plasma magnetron co-sputtering for gas sensing applications
- 29 Downloads
In this work, a gas sensor is fabricated from polycrystalline nickel cobaltite nano films deposited on transparent substrates by closed-field unbalanced dual-magnetrons (CFUBDM) co-sputtering technique. Two targets of nickel and cobalt are mounted on the cathode of discharge system and co-sputtered by direct current (DC) argon discharge plasma in presence of oxygen as a reactive gas. The total gas pressure is 0.5 mbar and the mixing ratio of Ar:O2 gases is 5:1. The characterization measurements performed on the prepared films show that their transmittance increases with the incident wavelength, the polycrystalline structure includes 5 crystallographic planes, the average particle size is about 35 nm, the electrical conductivity is linearly increasing with increasing temperature, and the activation energy is about 0.41 eV. These films show high sensitivity to ethanol vapor.
KeywordsNickel cobaltite magnetron sputtering reactive sputtering gas sensing
Authors would like to thank people at Plasma-Processing Lab at University of Central Oklahoma (USA) for the experimental assistance during the work.
- S. K. Chang, Z. Zainal, K. B. Tan, and N. A. Yusof, “Surface morphology and crystallinity of metal oxides in nickel-cobalt binary system,” Sains Malaysiana, 2012, 41(4): 465–470.Google Scholar
- O. A. Hamadi, “Characteristics of CdO-Si heterostructure produced by plasma-induced bonding technique,” Proceedings of the Institution of Mechanical Engineers Part L: Journal of Materials Design & Applications, 2008, 222(1): 65–71.Google Scholar
- O. A. Hamadi, “Effect of annealing on the electrical characteristics of CdO-Si heterostructure produced by plasma-induced bonding technique,” Iraqi Journal of Applied Physics, 2008, 4(3): 34–37.Google Scholar
- R. Ding, L. Qai, and H. Y. Wang, “Scalable electrodeposition of cost-effective microsized NiCo2O4 electrode materials for practical applications in electrochemical capacitors,” ECS Electrochem Letters, 2012, 1(3): A43–A46.Google Scholar
- S. U. Offiah, A. C. Nwanya, S. C. Ezugwu, B. T. Sone, R. U. Osuji, M. Maaza, et al., “Chemical bath synthesis and physico-chemical characterizations of NiO-CoO composite thin films for supercapacitor applications,” International Journal of Electrochemical Science, 2014, 9(10): 5837–5848.Google Scholar
- N. A. Bakr, S. A. Salman, and A. M. Shano, “Effect of Co doping on structural and optical properties of NiO thin films prepared by chemical spray pyrolysis method,” International Letters of Chemistry, Physics and Astronomy, 2015, 2: 15–30.Google Scholar
- O. A. Hammadi, “Characterization of SiC/Si heterojunction fabricated by plasma-induced growth of nanostructured silicon carbide layer on silicon surface,” Iraqi Journal of Applied Physics, 2016, 12(2): 9–13.Google Scholar
- N. S. Umeokwonna, A. J. Ekpunobi, and P. I. Ekwo, “Effect of cobalt doping on the optical properties of nickel cobalt oxide nanofilms deposited by electrodeposition method,” International Journal of Technical Research and Applications, 2015, 3(4): 347–351.Google Scholar
- O. A. Hammadi, M. K. Khalaf, F. J. Kadhim, and B. T. Chiad, “Operation characteristics of a closed-field unbalanced dual-magnetrons plasma sputtering system,” Bulgarian Journal of Physics, 2014, 41(1): 24–33.Google Scholar
- O. A. Hammadi, M. K. Khalaf, and F. J. Kadhim, “Silicon nitride nanostructures prepared by reactive sputtering using closed-field unbalanced dual magnetrons,” Proceedings of the Institution of Mechanical Engineers Part L: Journal of Materials Design & Applications, 2017, 231(5): 479–487.Google Scholar
- O. A. Hammadi, M. K. Khalaf, and F. J. Kadhim, “Fabrication of UV photodetector from nickel oxide nanoparticles deposited on silicon substrate by closed-field unbalanced dual magnetron sputtering techniques,” Optical & Quantum Electronics, 2015, 47(2): 1–9.Google Scholar
- O. A. Hammadi, M. K. Khalaf, and F. J. Kadhim, “Fabrication and characterization of UV photodetectors based on silicon nitride nanostructures prepared by magnetron sputtering,” Proceedings of the Institution of Mechanical Engineers Part N: Journal of Nanoengineering & Nanosystems, 2015, 230(1): 32–36.Google Scholar
- A. A. Anber and F. J. Kadhim, “Preparation of nanostructured SixN1-x thin films by DC reactive magnetron sputtering for tribology applications,” Silicon, 2017, pp. 1–4.Google Scholar
- M. A. Hameed and Z. M. Jabbar, “Preparation and characterization of silicon dioxide nanostructures by DC reactive closed-field unbalanced magnetron sputtering,” Iraqi Journal of Applied Physics, 2016, 12(4): 13–18.Google Scholar
Open Access This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.