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SiO2 nanodot arrays using patterned functionalization of self-assembled block copolymer and selective adsorption of amine-terminated polydimethylsiloxane

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Abstract

Silicon dioxide (SiO2) nanodot arrays were fabricated by the selective adsorption of amine-terminated polydimethylsiloxane on functionalized block copolymer thin films. A polystyrene-b-poly(acrylic acid/acrylic anhydride) thin film was created by the acid-catalyzed thermal deprotection of polystyrene-b-poly(tert-butyl acrylate). The amine-terminated polydimethylsiloxane selectively adsorbed on poly(acrylic acid) (PAA)/(acrylic anhydride) (AN) spherical nanodomains using a simple dipping method. Patterned SiO2 nanodot arrays were also fabricated using polystyrene-b-poly(tert-butyl acrylate) coated on the patterned SU-8 film. The final SiO2 nanodot arrays were obtained by the calcination of an organosilicon film.

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Authors and Affiliations

  1. Department of Chemistry, Korea Advanced Institute of Science and Technology, Daejeon, 305-701, Korea

    Su Min Kim, Se Jin Ku & Jin-Baek Kim

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  1. Su Min Kim
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  2. Se Jin Ku
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  3. Jin-Baek Kim
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Correspondence to Jin-Baek Kim.

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Kim, S.M., Ku, S.J. & Kim, JB. SiO2 nanodot arrays using patterned functionalization of self-assembled block copolymer and selective adsorption of amine-terminated polydimethylsiloxane. Macromol. Res. 19, 891–896 (2011). https://doi.org/10.1007/s13233-011-0903-z

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  • DOI: https://doi.org/10.1007/s13233-011-0903-z

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