Abstract
A novel technique is used to study the moisture diffusivity influence in the free surface of an elastic semiconductor medium according to a one-dimensional (1D) deformation. The problem is formulated to study the coupled between the plasma, thermo-elastic waves, and moisture diffusivity. The investigation is conducted during a photothermal transport process with the effects of moisture diffusivity. The governing equations of the elastic waves, carrier density, heat conduction equation, moisture equation, and constitutive relationships are obtained for the thermo-elastic medium using the Laplace transform method. The mechanical stress, thermal, and plasma boundary conditions are applied to obtain the basic physical quantities in the Laplace domain. The inversion of the Laplace transform with the numerical method is applied to obtain the complete solutions in the time domain for the main physical fields under investigation. The effects of thermoelectric, thermoelastic, and reference moisture parameters of the applied force on the displacement component, moisture concentration, carrier density, force stress, and temperature distribution have been discussed graphically.
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Acknowledgements
The authors extend their appreciation to Princess Nourah bint Abdulrahman University for fund this research under Researchers Supporting Project number (PNURSP2023R154) Princess Nourah bint Abdulrahman University, Riyadh, Saudi Arabia.
Funding
The authors extend their appreciation to Princess Nourah bint Abdulrahman University for fund this research under Researchers Supporting Project number (PNURSP2023R154) Princess Nourah bint Abdulrahman University, Riyadh, Saudi Arabia.
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Kh. Lotfy: Conceptualization, Methodology, Software, Data curation. E. Elidy: Writing- Original draft preparation, Visualization. Ramdan. S. Tantawi: Visualization, Investigation, Software, Validation. A. El-Bary: Writing- Reviewing and Editing. S. El-Sapa: Supervision, Investigation, Software, Validation.
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El-Sapa, S., Lotfy, K., Elidy, E.S. et al. Photothermal Excitation Process in Semiconductor Materials under the Effect Moisture Diffusivity. Silicon 15, 4171–4182 (2023). https://doi.org/10.1007/s12633-023-02311-y
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DOI: https://doi.org/10.1007/s12633-023-02311-y