Skip to main content
SpringerLink
Log in

Deposition of Organosilicon-Plasma Coating onto Fine Graphite Micropowder with a Downstream Tubular PECVD Reactor

  • Original Paper
  • Published:
Silicon Aims and scope Submit manuscript

Abstract

Fine graphite micropowder was processed in a downstream tubular reactor to perform a fast and homogeneous plasma-enhanced chemical vapor deposition of an organosilicon-plasma coating onto the powder surface. As a single process run results in the deposition of a non-continuous coating, consisting of a nanoparticle distribution, on the powder surface, the powder was repeatedly reprocessed until a continuous coating was obtained. The coating was imaged with focused ion-beam scanning electron microscopy and chemically characterized with Raman spectroscopy and X-ray photoelectron spectroscopy. The assessment of the powder flowability was also performed to investigate the roughness of the coated surface. The chemical characterization indicated that the coating is composed of amorphous hydrogenated silicon carbide with a little oxygen contamination.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. H. Yasuda, Plasma Polymerization, academic press Inc., USA 1985

  2. Chapman B (1980) Glow Discharge Processes: Sputtering and Plasma Etching. Wiley, USA

    Google Scholar 

  3. V.R. Giampietro, Ph.D. Thesis, ETH Zurich, 2018

  4. Jafari R, Tatoulian M (2011) F. Arefi-Khonsari. Reactive & Functional Polymers 71:520

    Article  CAS  Google Scholar 

  5. Sonnenfeld A, Spillmann A, Arpagaus C, Rudolf von Rohr P (2009). Plasma Processes and Polymer 6:170

    Article  CAS  Google Scholar 

  6. Inagaki N, Tasaka S, Ishij K (1993). J Appl Polym Sci 48:1433

    Article  CAS  Google Scholar 

  7. Giampietro VR, Roth C, Gulas M, Wood V, Rudolf von Rohr P (2016). Plasma Process Polym 13:334

    Article  CAS  Google Scholar 

  8. Xu C, Zhu J (2005). Chemical Engineering Science 60:6529

    Article  CAS  Google Scholar 

  9. Bretagnol F, Tatoulian M, Arefi-Khonsari F, Lorang G, Amouroux J (2004). Reactive & Functional Polymers 61:221

    Article  CAS  Google Scholar 

  10. Caquineau L, Aiche H, Vergnes B, Despax B (2012). Caussat, Surface & Coatings Technology 206:4814

    Article  CAS  Google Scholar 

  11. Godfrey SP, Kinmond EJ, Badyal JPS, Little IR (2001). Chem Mater 13:513

    Article  CAS  Google Scholar 

  12. Bayer C, Karches M, Matthews A, von Rohr PR (1998). Chemical Engineering & Technology 21:427

    Article  CAS  Google Scholar 

  13. von Rohr PR, Borer B (2007). Chem Vap Depos 13:499

    Article  CAS  Google Scholar 

  14. Borer B (2005) Ph. Rudolf von Rohr. Surface & Coatings Technology 200:377

    Article  CAS  Google Scholar 

  15. Borer B, Sonnenfeld A (2006) Ph. Rudolf von Rohr. Surface & Coatings Technology 201:1757

    Article  CAS  Google Scholar 

  16. Wei F, Zhu JX (1996). Journal of Chemical Engineering 64:345

    CAS  Google Scholar 

  17. Arpagaus C, Sonnenfeld A, Rudolf von Rohr P (2005). Chemical Engineering Technology 28:87

    Article  CAS  Google Scholar 

  18. Roth C, Keller L, Rudolf von Rohr P (2012). Surface & Coating Technology 206:3832

    Article  CAS  Google Scholar 

  19. B. Borer, Ph.D. Thesis, ETH Zurich, 2005

  20. Roth C, Kuensch Z, Sonnenfeld A, Rudolf von Rohr P (2011). Surface & Coating Technology 205:S597

    Article  CAS  Google Scholar 

  21. C. Roth, Ph.D. Thesis, ETH Zurich, 2012

  22. Chung DDL (2002). Journal of Materials Science 37:1475

    Article  CAS  Google Scholar 

  23. Terranova ML, Orlanducci S, Tamburri E, Guglielmotti V, Rossi M (2014). J Power Sources 246:167

    Article  CAS  Google Scholar 

  24. Ferrari AC, Robertson J (2000). Phys Rev B 61:14095

    Article  CAS  Google Scholar 

  25. Nisol B, Reniers F (2015). J Electron Spectrosc Relat Phenom 200:311

    Article  CAS  Google Scholar 

  26. Seah MP (2001). Surface Interface Analysis 31:721

    Article  CAS  Google Scholar 

  27. G.E. Muilenberg (Ed.), Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Corporation (Physical Electronics Division), Eden Prairie, MN, 1979

  28. Atzei D, Fantauzzi M, Rossi A, Fermo P, Piazzalunga A, Valli G, Vecchi R (2014). Appl Surf Sci 307:120

    Article  CAS  Google Scholar 

  29. Alexander MR, Short RD, Jones FR (1996). J Mater Sci 31:1879

    Article  CAS  Google Scholar 

  30. Nemanick EJ, Hurley PT, Webb LJ, Knapp DW, Michalak DJ, Brunschwig BS, Lewis NS (2006). J Phys Chem B 110:14770S

    Article  CAS  Google Scholar 

  31. Beamson G, Briggs D (1992) High Resolution XPS of Organic Polymers: The Scienta ESCA300 Database. Wiley, Chichester

    Google Scholar 

  32. Avila A, Montero I, Galán L, Ripalda JM, Levy R (2001). J Appl Phys 89:212

    Article  CAS  Google Scholar 

  33. Scofield JH (1976). J Electron Spectrosc Relat Phenom 8:129

    Article  CAS  Google Scholar 

  34. Reilman RF, Msezane A, Manson ST (1976). J Electron Spectrosc Relat Phenom 8:389

    Article  CAS  Google Scholar 

  35. Seah MP, Dench WA (1979). Surf Interface Anal 1:2

    Article  CAS  Google Scholar 

  36. Mayer C.K.K., Ph.D. Thesis, ETH Zurich, 2011

  37. S. Hofmann, Auger- and X-Ray Photoelectron Spectroscopy in Materials Science, Springer-Verlag, Heidelberg, D, 2013

  38. D. Schulze, Flow Properties of Powders and Bulk Solids, www.dietmar-schulze.com/grdle1.pdf (accessed February, 2014)

  39. Robertson J (2002). Material Science and Engineering R37:129

    CAS  Google Scholar 

  40. Ding YS, Li WN, Iaconetti S, Shen XF, DiCarlo J, Galasso FS, Suib SL (2006). Surface & Coatings Technology 200:3041

    Article  CAS  Google Scholar 

  41. Cançadoa LG, Takaia K, Enokia T, Endob M, Kimb YA, Mizusakib H, Spezialic NL, Jorioc A, Pimentac MA (2008). Carbon 46:272

    Article  CAS  Google Scholar 

  42. Wang H, Yoshio M, Abe T, Ogumi Z (2002). J Electrochem Soc 149(4):A499

    Article  CAS  Google Scholar 

  43. Choi WK, Loo FL, Ling CH, Loh FC, Tan KL (1995). J Appl Phys 78:7289

    Article  CAS  Google Scholar 

  44. Choi WK, Chan YM, Ling CH, Lee Y, Gopalakrishnan R, Tan KL (1995). J Appl Phys 77:827

    Article  CAS  Google Scholar 

  45. Nalwa HS (ed) (2001) Silicon-Based Materials and Devices. academic press, USA

    Google Scholar 

  46. Derst CWG, Bhatia KL, Kratschmer W, Kalbitzer S (1989). Appl Phys Lett 54:1722

    Article  CAS  Google Scholar 

  47. Xu Z, He Z, Song Y, Fu X, Rommel M, Luo X, Hartmaier A, Zhang J, Fang F (2018). Micromachines 9(7):361

    Article  PubMed Central  Google Scholar 

  48. Annett Thøgersen JH, Selj ES (2012). Marstein, Journal of the Electrochemical Society 159(5):D276

    Article  CAS  Google Scholar 

  49. Fonseca JLC, Badyal JPS (1992). Macromolecules 25:4730

    Article  CAS  Google Scholar 

  50. Fonseca JLC, Tasker S, Apperley DC, Badyal JPS (1996). Macromolecules 29:17

    Article  Google Scholar 

Download references

Acknowledgements

The Scientific Center for Optical and Electron Microscopy of the ETH Zürich is gratefully acknowledged for providing access to FIB-SEM facility and training. Prof. Dr. Antonella Rossi and Mr. Giovanni Cossu of the Department of Materials of the ETH Zürich are also gratefully acknowledged for providing access to XPS facility, training and technical support, while Dr. Robert Büchel of the Institute of Process Engineering of the ETH Zürich is gratefully acknowledged for providing training on Raman spectroscopy. Financial support comes from the Commission of Technology and Innovation and the Claude & Giuliana Foundation (Switzerland).

Author information

Authors and Affiliations

  1. Institute of Process Engineering, ETH Zürich, Sonneggstrasse 3, 8092, Zurich, Switzerland

    V. R. Giampietro & P. Rudolf von Rohr

  2. Imerys Graphite & Carbon, Strada industriale 12, 6743, Bodio, Switzerland

    M. Gulas

  3. Department of Information Technology and Electrical Engineering, ETH Zürich, Gloriastrasse 35, 8092, Zurich, Switzerland

    V. Wood

Authors
  1. V. R. Giampietro
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. M. Gulas
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. V. Wood
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. P. Rudolf von Rohr
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to V. R. Giampietro.

Additional information

Publisher’s Note

Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Giampietro, V.R., Gulas, M., Wood, V. et al. Deposition of Organosilicon-Plasma Coating onto Fine Graphite Micropowder with a Downstream Tubular PECVD Reactor. Silicon 11, 2185–2192 (2019). https://doi.org/10.1007/s12633-018-0035-6

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s12633-018-0035-6

Keywords

Search

Navigation