Abstract
We study the effective resist dispensing in continuous Roll-to-Roll (R2R) nanoimprinting system by using a simple and controlled airbrush coating method. Compared to common spin-coating or drop-casting, airbrushing can better afford the continuous coating operation required in a R2R nanoimprinting system with controlled thickness and uniformity. We use a UV-curable epoxysilsesquioxane (SSQ) and propylene glycol methyl ether acetate (PGMEA) as a concentration control agent, which are airbrushed for a controlled time over a continuously fed flexible or rigid substrate in a R2R conveyer. The R2R nanoimprinting is successfully conducted with uniform pattern quality. By modulating the airbrushing time and resist concentration, the residual layer thickness (RLT) of R2R-imprinted patterns can be readily controlled for specific uses.
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Sungkwan Koo and Sung Ho Lee contributed equally to this work
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Koo, S., Lee, S.H., Kim, J.D. et al. Controlled airbrush coating of polymer resists in Roll-to-Roll nanoimprinting with regimented residual layer thickness. Int. J. Precis. Eng. Manuf. 17, 943–947 (2016). https://doi.org/10.1007/s12541-016-0115-8
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DOI: https://doi.org/10.1007/s12541-016-0115-8