Sub-micro to nanometer scale laser direct writing techniques with a contact probe
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Modern laser direct writing techniques provide tools for high-precision fabrication and manufacturing at the micro scale. As the integration of devices increases, the feature size is being reduced to the nanometer scale. In this paper, we developed a contact-probe-based laser direct writing technique that covers the sub-micro to nanometer scale. The proposed probe uses a solid immersion lens or a nano-aperture to enhance the resolution in a near-field writing method. We integrated several of the proposed probes with a conventional laser direct writing system and achieved pattern resolutions up to 35 nm with a 405 nm wavelength laser. Furthermore, the scanning speed (∼ 10 mm/s) of the probes was high enough to use it in actual industry fabrication processes. With the proposed probe-based system, electronic, photonic, or plasmonic devices that require sub-micro meter scale features can be fabricated by means of laser direct writing. The minimum width of the line pattern recorded with the plasmonic device was 35nm.
KeywordsLaser direct writing Nano-aperture Near-field recording Solid immersion lens Surface plasmon polariton
wavelength of laser
numerical aperture of optics
Full Width Half Maximum
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