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Structural, electrical, and optical properties of reactively sputtered SnO2 thin films

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Abstract

SnO2 thin films prepared by reactive rf magnetron sputtering have been investigated to examine the effect of deposition parameters on its crystallinity and electrical and optical properties. Of particular interest was whether the nonequilibrium nature of sputtering could create large departures from the bulk defect properties, especially in amorphous films. Two deposition parameters were examined: substrate temperature (Tsub) and oxygen content. The films were characterized by X-ray diffraction (XRD), optical transmission, four point probe electrical conductivity, and Hall effect measurements. The crystallinity was found to be enhanced by the incease in each of the three processing variables. Below a substrate temperature of 300 °C a large processing window for depositing amorphous SnO2 was found.

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References

  1. K. Hillie and H. Swart, Appl. Surf. Sci. 253, 85136 (2007).

    Article  Google Scholar 

  2. W.-P. Tai and K. Inoue, Mater. Lett. 57, 1508 (2003).

    Article  CAS  Google Scholar 

  3. R. Deshmukh, S. Badadhe, M. Vaishampayan, and I. Mulla, Mater. Lett. 62, 4328–4331 (2008).

    Article  CAS  Google Scholar 

  4. N. J. Kim, Y. H. La, H. I. Sang, W-T Han, and B. K. Ryu, Electron. Mater. Lett. 5, 209 (2009).

    Article  CAS  Google Scholar 

  5. S. Samson and C. Fonstad, J. Appl. Phys. 44, 4618 (1973).

    Article  CAS  Google Scholar 

  6. L. Roman, R. Valaski, C. Canestraro, E. Magalha, C. Persson, R. Ahuja, I. Pepe, and A. Ferreira da Silva, Appl. Surf. Sci. 252, 5361 (2006).

    Article  CAS  Google Scholar 

  7. T. Serin, N. Serin, S. Karadeniz, H. Sarı, N. Tugluoglu, and O. Pakma, J. Non-Cryst. Solids 352, 209 (2006).

    Article  CAS  Google Scholar 

  8. Z. Songqing, Z. Yueliang, W. Shufang, W. Kun, and H. Peng, Rare Metals 25, 693 (2006).

    Article  Google Scholar 

  9. S. Rozati, Mater. Charact. 57, 150 (2006).

    Article  CAS  Google Scholar 

  10. S. Tamura, T. Ishida, H. Magara, T. Mihara, O. Tabata, and T. Tatsuta, Thin Solid Films 343–344, 142 (1999).

    Article  Google Scholar 

  11. T. Racheva and G. Critchlow, Thin Solid Films 292, 299 (1997).

    Article  CAS  Google Scholar 

  12. H. Ohsaki, Thin Solid Films 281–282, 223 (1996).

    Article  Google Scholar 

  13. T. Yamazaki, U. Mizutani, and Y. Iwama, Jpn. J. Appl. Phys. 22, 454 (1983).

    Article  CAS  Google Scholar 

  14. A. De and S. Ray, J. Phys. D: Appl. Phys. 24, 719 (1991).

    Article  CAS  Google Scholar 

  15. D. Jousse, C. Constantino, and I. Chambouleyron, J. Appl. Phys. 54, 430 (1983).

    Google Scholar 

  16. S. Muranaka, Y. Bando, and T. Takada, Thin Solid Films 86, 11 (1981).

    Article  CAS  Google Scholar 

  17. K. Sundaram and G. Bhagavat, J. Phys. D: Appl. Phys. 14, 333 (1981).

    Article  CAS  Google Scholar 

  18. G. V. Samsonov, The Oxide Handbook, 2 nd ed., IFI/PLENUM, New York (1982).

    Google Scholar 

  19. S. Hamzaoui and M. Adnane, Applied Energy 65, 19 (2000).

    Article  CAS  Google Scholar 

  20. M. Gubbins, V. Casey, and S. Newcomb, Thin Solid Films 405, 270 (2002).

    Article  CAS  Google Scholar 

  21. A. Espinosa, N. Menendez, C. Prieto, and A. de Andres, J. Non-Cryst. Solids 354, 5269 (2008).

    Article  CAS  Google Scholar 

  22. B. Mukashev, S. Tokmoldin, N. Beisenkhanov, S. Kikkarin, I. Valitova, V. Glazman, A. Aimagambetov, E. Dmitrieva, and B. Veremenithev, Mater. Sci. Eng. B 118, 164 (2005).

    Article  Google Scholar 

  23. R. Howson, H. Barankova, and A. Spencer, Thin Solid Films 196, 315 (1991).

    Article  CAS  Google Scholar 

  24. J. Ko, I. Kim, D. Kim, K. Lee, T. Lee, J.-H. Jeong, B. Cheong, Y. Baik, and W. Kim, Thin Solid Films 494, 42 (2006).

    Article  CAS  Google Scholar 

  25. W. Choi, J. Cho, S. Song, H. Jung, S. Koh, K. Yoon, C. Lee, M. Sung, and K. Jeong, Thin Solid Films 304, 85 (1997).

    Article  CAS  Google Scholar 

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Authors and Affiliations

  1. Graduate School of NID Fusion Technology, Seoul National University of Technology, 172 Gongneong 2-dong, Nowon-gu, Seoul, 139-743, Korea

    Sarah Eun-Kyung Kim

  2. Applied Research & Technology Center, Motorola, 2900 S. Diablo Way, Suite 150, Tempe, AZ, 85282, USA

    Manny Oliver

Authors
  1. Sarah Eun-Kyung Kim
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  2. Manny Oliver
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Correspondence to Sarah Eun-Kyung Kim.

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Kim, S.EK., Oliver, M. Structural, electrical, and optical properties of reactively sputtered SnO2 thin films. Met. Mater. Int. 16, 441–446 (2010). https://doi.org/10.1007/s12540-010-0614-6

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  • DOI: https://doi.org/10.1007/s12540-010-0614-6

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