Abstract
One of the core technologies used for high-density integration of electronic parts is a lithography method that draws a microcircuit by irradiating light onto photoresist. Because maskless lithography technology that employs a digital micromirror device (DMD) uses continuous exposure patterns, a huge amount of image frame data is required, and, moreover, a long calculation time is required to create exposure pattern images. In this paper, we propose a rasterization method that exposes continuous image frames onto a single overlay lithography image using GPU-accelerated path rendering and CPU parallel computing, creating a high-quality exposure pattern image at a high speed. This method enables effective rasterization using multiple CPU and GPU cores to create lithography image data. Additionally, it is possible to reduce the size of the data file by exposing a printed circuit board (PCB) in a single overlay image frame, rather than the conventional consecutive frames.
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Jinwon Lee is a Ph.D. student in the Department of Industrial Engineering at Ajou University, Korea. He obtained his master’s degree in industrial engineering in 2012 at Ajou University. His current research interests are geometric modeling, human simulation and 3-D simulation in virtual reality environment.
Hyungku Lee is the founder and CEO of LEETECH Co. Ltd (www.leetechkr. com), a manufacturer of semiconductors and P.C.B equipment. He obtained his Ph.D. in mechanical engineering in 2018 at Ajou University, Korea. His current research interests are the light direct imaging (LDI) system and its related application platform.
Jeongsam Yang is a Professor in the Department of Industrial Engineering and is leading the CAD laboratory (http://cadlab.ajou.ac.kr) at Ajou University, Korea. He worked at Carnegie Mellon University (USA) and Clausthal University of Technology (Germany) as a Visiting Researcher, and the University of Wisconsin-Madison (USA) as a Postdoctoral Associate. He obtained his Ph.D. in mechanical engineering in 2004 at KAIST. His current research interests are product data quality (PDQ), VR application in product design, product data management (PDM), knowledge-based design system, and geometry modeling.
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Lee, J., Lee, H. & Yang, J. A rasterization method for generating exposure pattern images with optical maskless lithography. J Mech Sci Technol 32, 2209–2218 (2018). https://doi.org/10.1007/s12206-018-0431-2
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DOI: https://doi.org/10.1007/s12206-018-0431-2