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Maskless laser direct imaging lithography using a 355-nm UV light source in manufacturing of flexible fine dies

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Abstract

This paper describes the results of the application of laser direct imaging (LDI) lithography for dimensional tolerance improvement through surface treatment of cutting edge in the flexible fine dies (FFD). Laser direct imaging lithography was successfully performed on AISI W1-8 substrates by a specifically designed laser system using UV 355 nm light source. The characteristics of patterned line width according to conditions such as scan speed and multi pass were investigated by optical microscope. The average line width of LDIed patterns was observed to be about 1 mm. The experimental results show that the line width of patterned samples was reduced with increasing scan speed and decreasing repetition number (R/N) of scanning. This conclusion proves the feasibility in the selectively application for manufacturing flexible fine die.

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Correspondence to Myungchang Kang.

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Recommended by Associate Editor In-Ha Sung

Ki-Taek Ryoo is a president of Finetech co., ltd. It mainly research and develop for flexible fine dies with high resolution. He has a bachelor’s degree from Pusan National University and a master’s course at Graduate School of Convergence Science in same University. Present research field is an optimizing of the flexible fine dies.

Myung-Chang Kang is a professor in the Graduate School of Convergence Science, Pusan National University. His research fields are a study on the fabrication of hybrid materials and the application of hybrid machining. He takes part in base project through the Global Frontier Hybrid Interface Materials (GFHIM) of the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT & Future Planning.

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Ryoo, K., Kim, M., Sung, J. et al. Maskless laser direct imaging lithography using a 355-nm UV light source in manufacturing of flexible fine dies. J Mech Sci Technol 29, 365–370 (2015). https://doi.org/10.1007/s12206-014-1243-7

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  • DOI: https://doi.org/10.1007/s12206-014-1243-7

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