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Modeling of silicon nanoparticle formation in inductively coupled plasma using a modified collision frequency function

Abstract

A model is presented to describe particle growth in inductively coupled plasma. The model consists of plasma chemistry and a coagulation module that adopts a modified collision frequency function. The modified collision frequency function is modified by a collision correlation factor that reflects the repulsive force of the particle charge in plasma in order to describe the reduction of coagulation among medium size particles (around 100 nm). In this model, plasma state and concentration of nuclei are determined by a spatially averaged global model in the plasma chemistry module. Particle growth is calculated by a coagulation module. To verify the validity of the model, comparison analysis is performed between experimental data obtained with PBMS and models, some of which are modified by a collision correlation factor. The analysis is performed with respect to dependencies on synthesis time, plasma source power and chamber pressure. From the analysis, we confirm the validity of the model that adopts a modified collision frequency function for the plasma condition.

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Correspondence to Taesung Kim.

Additional information

Recommended by Associate Editor Dong Geun Lee

Yeongseok Kim received his Bachelor of Science degree in Mechanical Engineering from Sungkyunkwan University of Technology, Korea in 2012. Currently, he is a candidate of combined master’s and doctorate program in the School of Mechanical at Sungkyunkwan University. His research is focused on the modeling of nanoparticle synthesis.

Taesung Kim received his Bachelor of Science degree in Mechanical Engineering from Seoul National University of Technology, Korea in 1994. He then receive his Master of Science, and Doctor of Philosophy degrees in Mechanical Engineering from Minnesota University, USA in 1998, and 2002, respectively. Dr. Kim currently works as an associate professor in the School of Mechanical Engineering and adjunct professor in the SKKU Advanced Institute of Nano Technology at Sungkyunkwan University in Suwon, Korea. His research interests include nanoparticle synthesis, development of applications related with bio aerosol, Chemical Mechanical Polishing, and thin film synthesis.

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Kim, Y., Kim, H.U., Shin, Y. et al. Modeling of silicon nanoparticle formation in inductively coupled plasma using a modified collision frequency function. J Mech Sci Technol 28, 4693–4703 (2014). https://doi.org/10.1007/s12206-014-1036-z

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keywords

  • Silicon nanoparticle
  • Inductively coupled plasma
  • PBMS
  • Modified collision frequency function