Skip to main content

Fabrication and Performance Investigation of Karma Alloy Thin Film Strain Gauge

Abstract

Karma alloy thin film strain gauges were fabricated on alumina substrates by magnetron sputtering. The electrical properties of strain gauges annealed at different temperatures were then tested. The surface morphology and phase structure of the Karma alloy thin films were analyzed using X-ray diffraction and scanning electron microscopy. The effect of the annealing temperature on the performance of the Karma alloy thin film strain gauge was also investigated. As the annealing temperature increased, it was found that the resistivity of the thin films decreased, whereas the temperature coefficient of resistance (TCR) of the thin films increased. A Karma alloy thin film strain gauge was annealed at 200 °C, thereby obtaining a gauge factor of 1.7 and a corresponding TCR of 64.8 × 10−6 K−1. The prepared Karma alloy thin film strain gauge had a lower TCR than other strain gauges at room temperature. This result can provide a reference for the preparation and application of Karma alloy thin film strain gauges in specific scenarios.

This is a preview of subscription content, access via your institution.

References

  1. [1]

    KALININ V, LEIGH A, STOPPS A, et al. SAW torque sensor for marine applications [C]//Proceedings of IEEE 2017 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium. Piscataway: IEEE, 2017: 347–352.

    Chapter  Google Scholar 

  2. [2]

    JIANG X X, CHEN H B, CHEN Z K, et al. The research on torque measurement system based on surface acoustic wave sensor [C]//Proceedings of the 2017 IEEE International Conference on Information, Communication and Engineering. Piscataway: IEEE, 2017: 400–403.

    Google Scholar 

  3. [3]

    CHEN T, ZHANG Y. Research on marine diesel engine crankshaft pressure monitoring system [J]. China Water Transport, 2015, 15(10): 163–164 (in Chinese).

    Google Scholar 

  4. [4]

    LIU H, JIANG S W, JIANG H C, et al. Fabrication of PdCr thin film strain gauge and investigation on its sensitive properties at high temperature [J]. Chinese Journal of Sensors and Actuators, 2017, 30(3): 348–352 (in Chinese).

    Google Scholar 

  5. [5]

    CUI Y X, ZHANG Z C, DING W Y, et al. Study on fabrication of NiCr films based high temperature resistance strain gauge and its high temperature performance [J]. Chinese Journal of Scientific Instrument, 2016, 37(7): 1548–1555 (in Chinese).

    Google Scholar 

  6. [6]

    GRANT H P, PRZYBYSZEWSKI J S, ANDERSON W L, et al. Thin film strain gage development program [R]. Cleveland, Ohio: National Aeronautics and Space Administration, Lewis Research Center, 1983: 1–194.

    Google Scholar 

  7. [7]

    ZHANG J, YANG X D, JIANG S W, et al. Research and fabrication of NiCrAlY thin-film strain gauges [J]. Transducer and Microsystem Technologies, 2015, 34(4): 105–107 (in Chinese).

    Google Scholar 

  8. [8]

    YANG S Y, LI H F, LIN X K, et al. Effect of Al2O3/Al bilayer protective coatings on the high-temperature stability of PdCr thin film strain gages [J]. Journal of Alloys and Compounds, 2018, 759: 1–7.

    Article  Google Scholar 

  9. [9]

    GREGORY O J, CHEN X M, CRISMAN E E. Strain and temperature effects in indium-tin-oxide sensors [J]. Thin Solid Films, 2010, 518(19): 5622–5625.

    Article  Google Scholar 

  10. [10]

    AYERDI I, CASTAÑO E, GARCIA-ALONSO A, et al. Ceramic pressure sensor based on tantalum thin film [J]. Sensors and Actuators A, 1994, 42(1/2/3): 435–438.

    Article  Google Scholar 

  11. [11]

    YIN F Y. Strain gauge sensitive material and its characteristics [J]. Weighing Instrument, 1998, 27(4): 45–49 (in Chinese).

    Google Scholar 

  12. [12]

    GREENE J E. Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017 [J]. Journal of Vacuum Science & Technology A, 2017, 35(5): 05C204.

    Article  Google Scholar 

  13. [13]

    SUN H T, WANG X P, WANG L J, et al. Effect of annealing temperature on structural electrical and optical properties of ZnO/Mo/ZnO transparent conductive films [J]. Journal of Materials & Engineering, 2015, 33(3): 352–351 (in Chinese).

    Google Scholar 

  14. [14]

    LIU Y M, ZHANG J J, ZHANG W G, et al. Effects of annealing temperature on the properties of copper films prepared by magnetron sputtering [J]. Journal of Wuhan University of Technology (Materials Science Edition), 2015, 30(1): 92–96.

    Article  Google Scholar 

  15. [15]

    ZHANG H Y, LYU Y M. Effect of annealing temperature to the characteristics of Al-Nd alloy films [J]. Applications of IC, 2019, 36(6): 34–35 (in Chinese).

    Article  Google Scholar 

  16. [16]

    KIM Y J, LEE W B, CHOI K K. Effect of seed layers and rapid thermal annealing on the temperature coefficient of resistance of Ni-Cr thin films [J]. Thin Solid Films, 2019, 675: 96–102.

    Article  Google Scholar 

  17. [17]

    LAI L F, WANG J X, WANG H T, et al. Structures and properties of C-doped NiCr thin film deposited by closed-field unbalanced magnetron sputtering [J]. Journal of Electronic Materials, 2017, 46(1): 552–562.

    Article  Google Scholar 

  18. [18]

    PETLEY V, SATHISHKUMAR S, THULASI RAMAN K H, et al. Microstructural and mechanical characteristics of Ni-Cr thin films [J]. Materials Research Bulletin, 2015, 66: 59–64.

    Article  Google Scholar 

  19. [19]

    SHEN B Z, PENG L P, WANG X M, et al. Morphology structure and electrical properties of NiCr thin film grown on the substrate of silicon prepared by magnetron sputtering [J]. Journal of Wuhan University of Technology (Materials Science Edition), 2015, 30(2): 380–385.

    Article  Google Scholar 

  20. [20]

    CHUANG N C, LIN J T, CHEN H R. TCR control of Ni-Cr resistive film deposited by DC magnetron sputtering [J]. Vacuum, 2015, 119: 200–203.

    Article  Google Scholar 

  21. [21]

    WANG X P, ZHAO T X, JI H, et al. Effect of grain size on temperature coefficient of film resistivity of Pd thin films [J]. Acta Physica Sinica, 1994, 43(2): 297–302 (in Chinese).

    Article  Google Scholar 

Download references

Author information

Affiliations

Authors

Corresponding author

Correspondence to Congchun Zhang.

Rights and permissions

Reprints and Permissions

About this article

Verify currency and authenticity via CrossMark

Cite this article

Lei, P., Zhang, C., Pang, Y. et al. Fabrication and Performance Investigation of Karma Alloy Thin Film Strain Gauge. J. Shanghai Jiaotong Univ. (Sci.) 26, 454–462 (2021). https://doi.org/10.1007/s12204-021-2315-3

Download citation

Key words

  • thin film strain gauge
  • Karma alloy
  • magnetron sputtering
  • coefficient of resistance (TCR)
  • gauge factor

CLC number

  • TP 212