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Usage of simulated annealing algorithm in design of optical thin film

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Abstract

Simulated annealing algorithm is a mathematic model, which imitates the physical process of annealing. And optical thin film is widely used in many industry. Its design is difficult and can be regarded as an optimization problem. In this paper, we use the simulated annealing algorithm to design an edge filter, which is composed of 20 dielectric thin film layers with TiO2 and SiO2. The simulated annealing algorithm is a very robust algorithm for optical thin film design.

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Authors and Affiliations

  1. Department of Physics, Nanchang University, Nanchang, 330031, China

    Wen-liang Wang  (王文梁)

  2. Xuzhou Institute of Industry Technology, Xuzhou, 221140, Jiangsu, China

    Xiao-hong Rong  (戎晓红)

Authors
  1. Wen-liang Wang  (王文梁)
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  2. Xiao-hong Rong  (戎晓红)
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Correspondence to Wen-liang Wang  (王文梁).

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Wang, Wl., Rong, Xh. Usage of simulated annealing algorithm in design of optical thin film. J. Shanghai Jiaotong Univ. (Sci.) 16, 372–374 (2011). https://doi.org/10.1007/s12204-011-1164-x

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  • DOI: https://doi.org/10.1007/s12204-011-1164-x

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