Near-infrared carbon-implanted waveguides in Tb3+-doped aluminum borosilicate glasses
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Ion implantation has played a unique role in the fabrication of optical waveguide devices. Tb3+-doped aluminum borosilicate (TDAB) glass has been considered as an important magneto-optical material. In this work, near-infrared waveguides have been manufactured by the (5.5 + 6.0) MeV C3+ ion implantation with doses of (4.0 + 8.0) × 1013 ions·cm-2 in the TDAB glass. The modes propagated in the TDAB glass waveguide were recorded by a prism-coupling system. The finite-difference beam propagation method (FD-BPM) was carried out to simulate the guiding characteristics of the TDAB glass waveguide. The TDAB glass waveguide allows the light propagation with a single-mode at 1.539 μm and can serve as a potential candidate for future waveguide isolators.
KeywordsTb3+-doped aluminum borosilicate (TDAB) glass optical waveguide ion implantation
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This work was financially supported by the National Natural Science Foundation of China (Grant Nos. 11405041, 51502144 and 61475189).
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