Skip to main content
Log in

Measurement of optical mirror with a small-aperture interferometer

  • Research Article
  • Published:
Frontiers of Optoelectronics Aims and scope Submit manuscript

Abstract

In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Cheng H B. Interferometric null testing and the model for separating adjustment errors. Journal of Harbin Institute of Technology, 2006, 38(8): 1247–1250

    Google Scholar 

  2. Yang L. Advanced Optical Manufacture Technology. Beijing: Science Press, 2001, 326–365 (in Chinese)

    Google Scholar 

  3. Malacara D. Optical Shop Testing. New York: Wiley-Interscience, 1978, 245–296

    Google Scholar 

  4. Cheng H B, Feng Z J. Error-separation model for interferometric testing aspheric surfaces based on wavefront aberrations. Journal of Tsinghua University (Science and Technology), 2006, 46(2): 187–190

    MathSciNet  Google Scholar 

  5. Kim C J. Polynomial fit of interferograms. Applied Optics, 1982, 21(24): 4521–4525 doi:10.1364/AO.21.004521

    Article  Google Scholar 

  6. Chow W W, Lawrence G N. Method for subaperture testing interferogram reduction. Optics Letters, 1983, 8(9): 468–470

    Article  Google Scholar 

  7. De Hainaut C R, Erteza A. Numerical processing of dynamic subaperture testing measurements. Applied Optics, 1986, 25(4): 503–509

    Article  Google Scholar 

  8. Catanzaro B E, Connell S J, Mimovich M, Backovsky S, Williams G, Thomas J A, Barber D D, Johnston R A, Hylton J C, Dodson K J, Cohen E J. Cryogenic (70 K) measurement of an all-composite 2-meter diameter mirror. Proceedings of SPIE, the International Society for Optical Engineering, 2001, 4444: 238–255

    Google Scholar 

  9. Bray M. Stitching interferometer for large optics: recent developments of a system. Proceedings of SPIE, the International Society for Optical Engineering, 1999, 3492(2): 946–956

    Google Scholar 

  10. Bray M. Stitching interferometer for large plano optics using a standard interferometer. Proceedings of SPIE, Optical manufacturing and testing II, 1997, 3134(1): 39–50

    Google Scholar 

  11. Otsubo M, Okada K, Tsujiuchi J. Measurement of large plane surface shapes by connecting small-aperture interferograms. Optical Engineering, 1994, 33(2): 608–613

    Article  Google Scholar 

  12. Negro J E. Subaperture optical system testing. Applied Optics, 1984, 23(12): 1921–1930

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Haobo Cheng.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Gao, Y., Tam, H.Y., Wen, Y. et al. Measurement of optical mirror with a small-aperture interferometer. Front. Optoelectron. 5, 218–223 (2012). https://doi.org/10.1007/s12200-012-0233-6

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s12200-012-0233-6

Keywords

Navigation