Abstract
In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement.
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Gao, Y., Tam, H.Y., Wen, Y. et al. Measurement of optical mirror with a small-aperture interferometer. Front. Optoelectron. 5, 218–223 (2012). https://doi.org/10.1007/s12200-012-0233-6
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DOI: https://doi.org/10.1007/s12200-012-0233-6