Abstract
This paper presents the design, fabrication and packaging of RF MEMS switches that have CPW-converted-to-microstrip RF interface at the die level. With microstrip input and output ports the packaging of the dies become greatly simplified, doing away with the need for having off-chip matching and RF transition components inside the package. Two designs are presented, each based on a different philosophy for conversion of the inherent CPW version of the chip to microstrip planar transmission line; i) conversion to microstrip through RF matching, ii) CPW to microstrip on-chip via less transition. Detailed 3D EM simulation based studies were carried out to arrive at the final RF layouts. The switches were fabricated using the silicon on glass architecture and packaged in hermetic RF packages at 1 atm N\(_2\). Wafer level and post packaging test methods are described. Over the range DC to 10 GHz, the worst case packaged device insertion loss, return loss and isolation are −1.2 dB, −13 dB, −37.5 dB for the first design variant of the switch and are −1.2 dB, −11 dB and −30 dB respectively for the second design variant. The typical pull in voltage is 50 V.
Similar content being viewed by others
References
Rebeiz G M 2002 RF MEMS theory, design, and technology. New York, Wiley
Varadan Vijay K, Vinoy K J and Jose K A 2003 RF MEMS and their Applications Hoboken: Wiley
Lucyszyn S 2010 (Ed.) Advanced RF MEMS Cambridge: Cambridge University Press
Shailendra Singh, Malalahalli Sreenivasamurthy Giridhar, Cheemalamarri Venkata Narasimha Rao, Sangam Bhalke and Rafiqul Islam 2015 J. Micro Nanolith. MEMS MOEMS 14(1): 015002
Wartenberg Scott A 2002 RF Measurements of Die and Packages Boston: Arctec House
Terry C Edwards and Michael B Steer 2016 Foundations for Microstrip Circuit Design Wiley–IEEE
Simmons R N 2001 Coplanar waveguide circuits components and systems New York, Wiley-Interscience
Kim Jong-Man, Park Jae-Hyoung, Baek Chang-Wook and Kim Yong-Kweon 2004 The SiOG-based single crystalline silicon (SCS) RF MEMS switch with uniform characteristics. J. Microelectromechanical Systems 13: 1036–1042
Kim Jong-Man, Lee Sanghyo, Kim Jung-Mu, Baek Chang-Wook, Kwon Youngwoo and Kim Yong-Kweon 2005 A mechanically reliable digital-type single crystalline silicon (SCS) RF MEMS variable capacitor. J. Micromech. Microeng. 15: 1854
Giridhar M S, Ashwini Jambhalikar, Jiju John, Islam R, Ananda Behera, Nagendra C L, George Thachil, Srikanth P, Shailesh Somani, Darukesha B H M and Srinivasarao Bollu 2013 Design, fabrication, testing and packaging of asilicon micromachined radio frequency microelectromechanical series (RF MEMS) switch Sadhana 38: 297–316
Sai Saravanan G, Sandeep Chaturvedi, Prasad S, Sangam Bhalke, Muraleedharan Kuttanellore, Hidangmayum Sharma and Harish Vyas 2005 Pulse reversal electrodeposition for fine-grained structure and superior wire bond strength in metallisation of MMICs 13th Int. Workshop of Physics of Semiconductor Devices (IWPSD 2005) pp 847–851
Sai Saravanan G, Mahadeva Bhat K, Dattatreya Prasad S, Sandeep Chaturvedi, Muralidharan R, S Dhamodaran, N Sathish 2009 Optimization of pulse reversal electrodeposition with fine grains and low roughness for GaAs RF MEMS structures 2nd International Workshop on Electron Devices and Semiconductor Technology-2009 pp. 1–4
Chaturvedi Sandeep, Bhalke Sangam, Sai Saravanan G, Koul Shiban 2010 Electromagnetic Simulation and Characterization a Metal Ceramic Package for Packaging of High Isolation Switches Progress In Electromagnetics Research C 16: 111–125
Swathi S 2021 Design, Fabrication and Characterisation of RF MEMS Switch, M Tech project dissertation, Deptartment of ECE Nitte Meenakshi Institute of Technology, Bengaluru.
M S Giridhar, Pratheek T K, Ashwini Jambhalikar, J John, R Islam, Vedaprakash K, G Supriya , M. Viswanathan, V Vamsi Krishna, A V G Subramanyam, V Senthil Kumar 2017 Experimental studies on the enhancement of reliability of ohmic contact RF MEMS switches, ISSS International Conference on MEMS, Smart Materials, Structures and System 2017, Bangalore, India
Ai-Qun Liu RF MEMS Switches and Integrated Switching Circuits. New York, Springer 2010
Allyson L Hartzell, Mark G da Silva, Herbert Shea 2011 MEMS Reliability. New York, Springer
Czarnecki P, Rottenberg X, Soussan P, Ekkels P, Muller P, Nolmans P, De Raedt W, Tilmans H A C, Puers R, Marchand L and De Wolf I 2009 Effect of substrate charging on the reliability of capacitive RF MEMS switches, Sensors and Actuators A: Physical 154: 261–268
Acknowledgements
The authors gratefully acknowledge guidance and support from Dr. G. Sai Sravanan and Mr. S. Raghava of GAETEC for their help in wafer level electroplating which is a critical process in the realisation of RF MEMS switches. The authors would also like to thank the staff of ATQC, GAETEC for their high quality workmanship and technical expertise in the assembly and packaging of the RF MEMS switches described in this work. Ms. J D Pushpavalli, LEOS, is thanked for her support with the scanning electron microscope imaging of RF MEMS switches. Swathi S is thanked for her support in making the measurements on commercial RF MEMS switches. The authors are thankful to Dr. A V G Subramanyam, Dr. Vamsi Krishna Velidi and Mr. Deepankar Roy of U R Rao Satellite Center for enrichicing discussions on RF matters. Sincere thanks are due to Mr. Thippaiyya and Mr. Narasimhamurthy for their valuable technical support in device fabrication operations. The authors thank director LEOS, ISRO and director SAC, ISRO for their constant guidance and support.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Singh, S., Giridhar, M.S., Jambhalikar, A. et al. Design and development of broadband DC-10 GHz packaged RF MEMS switches with on chip CPW-microstrip transitions. Sādhanā 47, 65 (2022). https://doi.org/10.1007/s12046-022-01813-6
Received:
Revised:
Accepted:
Published:
DOI: https://doi.org/10.1007/s12046-022-01813-6