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Optimization for sinusoidal profiles in surface relief gratings recorded on photoresist

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Abstract

The formations of sinusoidal surface relief structures recorded in positive photoresist (Allresist AR-P 3120) have been studied and optimized for different recording parameters of gratings with spatial frequency of ∼1200 grooves/mm. A stable sinusoidal pattern generated using a two-beam laser interferometric technique was recorded in thin films of positive photoresist deposited on glass substrates. Several gratings were generated by varying the exposure time of interference pattern and time of chemical development of exposed media. Time duration of exposure for 90 s and chemical development for 15 s were observed to be optimum for the translation of the sinusoidal interference pattern into nearly-sinusoidal profiled grooves in the gratings for a developer AR-300-26 of dilution of 2:1 (developer:de-ionized water).

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Authors and Affiliations

  1. Applied Spectroscopy Division, Bhabha Atomic Research Centre, Mumbai, 400 085, India

    SANJIVA KUMAR, R B TOKAS, D V UDUPA & N K SAHOO

  2. Optics & Thin Film Laboratory, Bhabha Atomic Research Centre, VIZAG Facility, Autonagar, Visakhapatnam, 530 012, India

    AMRITA DEBNATH & K DIVAKAR RAO

Authors
  1. SANJIVA KUMAR
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  2. AMRITA DEBNATH
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  3. R B TOKAS
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  4. K DIVAKAR RAO
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  5. D V UDUPA
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  6. N K SAHOO
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Correspondence to SANJIVA KUMAR.

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KUMAR, S., DEBNATH, A., TOKAS, R.B. et al. Optimization for sinusoidal profiles in surface relief gratings recorded on photoresist. Pramana - J Phys 82, 289–294 (2014). https://doi.org/10.1007/s12043-013-0666-5

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  • DOI: https://doi.org/10.1007/s12043-013-0666-5

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