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Unstable plasma characteristics in mirror field electron cyclotron resonance microwave ion source

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Abstract

Electron cyclotron plasma reactor are prone to instabilities in specific input power [3–7] region (150–450 watts). In this region power absorption by gas molecules in the cavity is very poor and enhanced input power gets reflected substantially without increasing ion density. There are abrupt changes in plasma characteristics when input power was decreased from maximum to minimum, it was observed that reflected power changed from <2% to ∼50%. Minimum two jumps in reflected power were noticed in this specific power region and these appear to be highly sensitive to three stub tuner position in the waveguide for this particular input power zone. Unstable plasma region of this source is found to be dependent upon the magnetic field strength. Some changes in reflected power are also noticed with pressure, flow and bias and they are random in nature.

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Authors and Affiliations

  1. Microelectronics Group, Central Scientific Instruments Organisation, Sector-30, 160 020, Chandigarh, India

    S K Angra, Parshant Kumar, R R Dongaonkar & R P Bajpai

Authors
  1. S K Angra
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  2. Parshant Kumar
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  3. R R Dongaonkar
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  4. R P Bajpai
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Angra, S.K., Kumar, P., Dongaonkar, R.R. et al. Unstable plasma characteristics in mirror field electron cyclotron resonance microwave ion source. Pramana - J Phys 54, 763–769 (2000). https://doi.org/10.1007/s12043-000-0121-2

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  • DOI: https://doi.org/10.1007/s12043-000-0121-2

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