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Surface functionalization of HF-treated silicon nanowires

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Abstract

Versatile methods were employed to investigate the chemical reactivity of hydrogenterminated surface of silicon nanowires. The experimental results showed that coupling reaction took place when silicon nanowires reacted with 2,2,2-trifluoroethyl acrylate, and reductive deposition reaction occurred in the presence of inorganic salt such as HgCl2, and also co-reduction reaction took place in a solution containing both AuCl3 and PdCl2. The possible reaction mechanisms were studied and this study would be expected to favour the homogeneity, selectivity, reproducibility, and stability of SiNW devices or sensors.

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Authors and Affiliations

  1. Anhui Key Laboratory of Functional Molecular Solids, and College of Chemistry and Materials Science, Anhui Normal University, Wuhu, 241000, P.R. China

    Ming-Wang Shao, Hong Wang, Yan Fu & Jun Hua

  2. Center of Super-Diamond and Advanced Films (COSDAF) and Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China

    Dorothy-Duo-Duo Ma

Authors
  1. Ming-Wang Shao
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  2. Hong Wang
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  3. Yan Fu
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  4. Jun Hua
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  5. Dorothy-Duo-Duo Ma
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Correspondence to Ming-Wang Shao.

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Shao, MW., Wang, H., Fu, Y. et al. Surface functionalization of HF-treated silicon nanowires. J Chem Sci 121, 323–327 (2009). https://doi.org/10.1007/s12039-009-0037-4

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  • DOI: https://doi.org/10.1007/s12039-009-0037-4

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