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Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films

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Abstract

Silicon carbonitride (SiCN) thin films were deposited on p-Si (100) substrates with different \(\hbox {N}_{2}\) flow rates using SiC and \(\hbox {Si}_{3}\hbox {N}_{4}\) powder precursors by chemical vapour deposition. To investigate the structural, vibrational and mechanical properties, the SiCN thin films were characterized by atomic force microscopy, Raman spectroscopy, X-ray diffraction (XRD), Fourier transform infrared and nanoindentation techniques. The XRD results reveal nanocrystals embedded with amorphous networks in the SiCN thin films. An increase in the \(I_{\mathrm{D}}/I_{\mathrm{G}}\) ratio with an increase in the \(\hbox {N}_{2}\) flow rate indicated the increase of \(\hbox {sp}^{3}\) bonds in the SiCN thin film. The hardness (H), Young’s modulus (E), plasticity index (H / E) and \((H^{3}/E^{2})\) increase with an increase in the \(\hbox {N}_{2}\) flow rate.

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Acknowledgements

The authors would like to express their special thanks to Prof Prita Pant, Department of Metallurgical Engineering and Materials Science, Indian Institute of Bombay (IIT Bombay) for conducting nanoindentation experiments.

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Authors and Affiliations

  1. Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Sikkim Manipal University, Gangtok, 737136, India

    Dhruva Kumar, Ranjan Kr Ghadai, Soham Das & Ashis Sharma

  2. Department of Physics, National Institute of Technology Manipur, Langol, 795004, India

    Bibhu P Swain

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  1. Dhruva Kumar
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  2. Ranjan Kr Ghadai
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  3. Soham Das
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  4. Ashis Sharma
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Correspondence to Bibhu P Swain.

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Kumar, D., Ghadai, R.K., Das, S. et al. Effect of nitrogen flow rate on the mechanical properties of CVD-deposited SiCN thin films. Bull Mater Sci 42, 251 (2019). https://doi.org/10.1007/s12034-019-1937-7

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