Polycrystalline diamond thin films with outgrowing diamond (OGD) grains were deposited onto silicon wafers using a hydrocarbon gas (CH4) highly diluted with H2 at low pressure in a hot filament chemical vapour deposition (HFCVD) reactor with a range of gas flow rates. X-ray diffraction (XRD) and SEM showed polycrystalline diamond structure with a random orientation. Polycrystalline diamond films with various textures were grown and (111) facets were dominant with sharp grain boundaries. Outgrowth was observed in flowerish character at high gas flow rates. Isolated single crystals with little openings appeared at various stages at low gas flow rates. Thus, changing gas flow rates had a beneficial influence on the grain size, growth rate and electrical resistivity. CVD diamond films gave an excellent performance for medium film thickness with relatively low electrical resistivity and making them potentially useful in many industrial applications.
This is a preview of subscription content, access via your institution.
Buy single article
Instant access to the full article PDF.
Tax calculation will be finalised during checkout.
Abbas, T., M. Ullah, A.M. Rana, and R.M. Arif Khalil. 2007. Mater. Sci. Poland 25: 1161.
Bataineh, M., S. Khatami, and J. Asmussen Jr. 2005. J. Mater. Process Technol. 169: 26.
Buckley, G., T.D. Moustakas, L. Ye, and J. Voiron. 1989. J. Appl. Phys. 66: 3595.
Celii, F.G., D. White Jr., and A.J. Purdes. 1991. J. Appl Phys. 70: 5636.
Chen X, Sullivan J, Friedmann T and Murray Gibson J 2004 Microsci. Microanal. 10 (Suppl 2)
Chen, W., X. Lu, Q. Yang, C. Xiao, R. Sammynaiken, and J. Maley. 2006. Thin Solid Films 515: 1970.
Davis, R.F. 1992. Diamond films and coatings, 381. New Jersey: Noyes Publications.
Fan, Q.H., E. Pereira, and J. Cracio. 1999. J. Mater. Sci. 34: 1353.
Filik, J. 2005. Spectro. Euro. 17: 10.
Goodwin, D.G. 1993. J. Appl. Phys. 74: 6888.
Hirakuri, K.K., T. Kobayashi, E. Nakamura, N. Mutsukura, G. Friedbacher, and Y. Machi. 2001. Vacuum 63: 449.
Huang, J.Yu., R. Wen, and L.C. Shi. 1997. Mater. Lett. 32: 143.
Kobayashi, T., K.K. Hirakuri, N. Mutsukura, and M. Machi. 1999. Diamond Relat Mater. 8: 1057.
Li, X., J. Perkin, R. Collazo, R.J. Nimanich, and Z. Sitar. 2006. Diamond Relat Mater. 15: 1784.
Lu, X., Q. Yang, C. Xiao, and A. Hirose. 2007. Diamond Relat Mater. 16: 1623.
Ma, K.L., W.J. Zhang, Y.S. Zou, Y.M. Chong, K.L. Leung, I. Bello, and S.T. Lee. 2006. Diamond Relat Mater. 15: 626.
Okumura, Y., K. Kanayama, and K.-I. Shogaki. 2010. Combust Flame 157: 1052.
Ralchenko, V., I. Sychov, I. Vlasov, A. Valsov, V. Konov, A. Khomich, and S. Voronina. 1999. Diamond Relat Mater. 8: 189.
Rau, H., and F. Picht. 1992. J. Mater. Res. 7: 934.
Schwarz, S., S.M. Rosiwal, M. Frank, D. Breidt, and R.F. Singer. 2002. Diamond Relat Mater. 11: 589.
Shroder, R.E., R.J. Nemanich, and J.T. Glass. 1990. Phys. Rev. B41: 3738.
Silva Gicquel, F.A., A. Tardieu, P. Cledat, and T. Chauveau. 1996. Diamond Relat Mater. 5: 338.
Van der Pauw, L.J. 1958. Philips Res Rep. 13: 1.
Wada, N., and S.A.S. Olin. 1981. Physica B 105: 353.
Yu, J., R. Huang, L. Wen, and C. Shi. 1998. J. Mater. Sci. Lett. 17: 1011.
About this article
Cite this article
Ullah, M., Ahmed, E., Elhissi, A. et al. Low Resistance Polycrystalline Diamond Thin Films Deposited by Hot Filament Chemical Vapour Deposition. Bull Mater Sci 37, 579–583 (2014). https://doi.org/10.1007/s12034-014-0669-y
- Carbon materials
- chemical vapour deposition
- crystal growth
- thin films
- electrical resistivity
- grain size