Abstract
Zinc oxide (ZnO) thin films were deposited on Si (100) substrate through sputtering of zinc by DC magnetron, followed by thermal oxidation. Different deposition rates were used in coating films with 100 nm thickness (0·6–4·5 nm/s). Photoluminescence spectra of the produced samples were obtained and it was found that the violet emission peak intensity increases with deposition rate. Scanning electron microscopy (SEM) micrograph and atomic force microscopy (AFM) images for the zinc oxide films were obtained. Morphological changes due to various deposition rate are discussed in the light of changes observed in the ZnO crystals. Low coating rates produced smooth surface with small grains while higher deposition rates increased the surface roughness and larger grain size. AFM and SEM results are in good agreement and support the PL results.
Similar content being viewed by others
References
Aghli-Moghadam L, Baghizadeh A, Nabiyoni G, Farashiani A and Zendehnam A 2009 Appl. Phys. A97 805
Czternastek H 2004 Opto-Electron. Rev. 12 49
Daniel G P, Justinvictor V B, Nair P B, Joy K, Koshy P and Thomas P V 2010 Physica B 405 1782
Dikovska A O, Atanasov P A, Vasilev C, Dimitrov I G and Stoyanchov T R 2005 J. Optoelectron. Adv. Mater. 7 1329
Eaton P and West P 2010 Atomic force microscopy (Norwich: Oxford University Press)
Gao P X and Wang Z L 2005 J. Appl. Phys. 97 044304
Hwang D K, Kang S H, Lim J H, Jeong E, Oh J Y, Yang J H and Park S J 2005 Appl. Phys. Lett. 86 222101
Karuppuchamy S, Nonomura K, Yoshida T, Sugiura T and Minoura H 2002 Solid State Ionics 151 19
Kim D, Yun I and Kim H 2010 Curr. Appl. Phys. 10 S459
Lee C, Park A, Cho Y J, Lee W I and Kim H W 2008 Vacuum 82 1364
Liu C, Yun F and Morkoc H 2005 J. Mater. Sci. Mater. Electron. 16 555
Ozgur U, Alivov Y I, Liu C, Teke A, Reshchikov M A, Dogan S, Avrutin V, Cho S H and Morkoc H 2005 J. Appl. Phys. 98 041301
Roy S and Basu S 2002 Bull. Mater. Sci. 25 513
Samanta P K, Patra S K, Ghosh A and Chaudhuri P R 2009 Int. J. Nanosci. Nanotechnol. 1 81
Shamala K S, Murthy L C S and Narasimha Rao K 2004 Bull. Mater. Sci. 27 295
Shirazi M, Hosseinnejad M T, Zendehnam A, Ghorannevis Z and Ghoranneviss M 2011 Appl. Surf. Sci. 257 10233
Wang J X, Sun X W,Wei A, Lei Y, Cai X P, Li C M and Dong Z L 2006 Appl. Phys. Lett. 88 233106
Wang Q J, Pflugl C, Andress WF, Ham D and Capasso F O 2008 J. Vac. Sci. Technol. B26 1071
Zendehnam A, Shirazi M, Sadat M and Aghli-Moghadam L 2010 World Appl. Sci. J. 10 1473
Zhong-Lin L U, Wen-Qin Z, Ming-Xiang X U, Feng-Ming Z and You-Wei D U 2009 Chinese Phys. Lett. 26 116102
Acknowledgement
The authors would like to thank and appreciate the financial assistance rendered by Arak University and Iran nano-technology initiative.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
ZENDEHNAM, A., MIRZAEE, M. & MIRI, S. Influence of deposition rate on PL spectrum and surface morphology of ZnO nanolayers deposited on Si (100) substrate. Bull Mater Sci 37, 179–183 (2014). https://doi.org/10.1007/s12034-014-0638-5
Received:
Revised:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s12034-014-0638-5