Abstract
The equilibrium concentrations of various condensed and gaseous phases were calculated from thermodynamic modeling of MOCVD of ZrO2 films using a β-ketoesterate complex of zirconium as precursor. This leads to the construction of the ‘CVD phase stability diagram’ for the formation of solid phases. In the reactive ambient of oxygen, the calculations predict carbon-free ZrO2 film over a wide range of process conditions. The thermodynamic yields are in reasonable agreement with experimental observations, though the removal of carbon from the MOCVD grown films is not as complete as the thermodynamic calculations predict.
Similar content being viewed by others
References
Barnard A S, Yeredla R R and Xu H 2006 Nanotechnology 17 3039
Bernard C, Pons M, Blanquet E and Madar R 1999 MRS Bull. 24 27
Bourhila N, Felten F, Senateur J P, Schuster F, Madar R and Abrutis A 1997 Proc. Electrochem. Soc. 25 417
Colombo D G, Gilmer D C, Young Jr V G, Campbell S A and Gladfelter W L 1998 Chem. Vapor Depos. 4 220
Dharmaprakash M S and Shivashankar S A 2003a Mater. Res. Soc. Symp. Proc. 745 191
Dharmaprakash M S and Shivashankar S A 2003b Proc. Electrochem. Soc. PV8 900
Eriksson G 1971 Acta Chem. Scand. 25 651
Huang S S and Wu T B 2004 J. Vac. Sci. Technol. B22 1940
Ismail M G M U, Tsunatori H and Nakai Z 1990 J. Am. Ceram. Soc. 73 537
Jones A C et al 1998 Chem. Vapor Depos. 4 46
Kang S Y, Choi K H, Lee S K, Hwang C S and Kim H J 2000 J. Electrochem. Soc. 147 1161
Kim J S, Marzouk H A and Reucroft P J 1995 Thin Solid Films 254 33
Kytokivi A, Lakomaa E L and Root A 1996 Langmuir 12 4395
Li W, Liu X, Huang A and Chu P K 2007 J. Phys. D: Appl. Phys. 40 2293
Lin J M, Hsu M C and Fung K Z 2006 J. Power Sources 159 49
Morozova N B, Igumenov I K, Yushina I V, Ayupov B M and Lisoivan V I 1993 Inorg. Mater. 29 949
Morstein M, Pozsgai I and Spencer N D 1999 Chem. Vapor Depos. 5 151
Mukhopadhyay S, Shalini K, Lakshmi R, Devi A and Shivashankar S A 2002 Surf. Coat. Technol. 150 205
Pasko S V, Abrutis A and Hubert-Pfalzgraf L G 2004 Mater. Lett. 59 261
Patil U et al 2006 Chem. Vapor Depos. 12 172
Putkonen M and Niinisto L 2001 J. Mater. Chem. 11 3141
Smith R C et al 2000 Adv. Mater. Opt. Electron. 10 105
Stringfellow G B 1989 Organometallic vapour phase epitaxy—theory and practice (New York: Academic Press) Ch. 3
Urs U K, Dharmaprakash M S, Shivashankar S A and Row T N G 2003 Acta Crystallogr. E59 m83
Wolf W C, Sievers R E and Brown G H 1972 Inorg. Chem. 11 1995
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Dhar, S., Dharmaprakash, M.S. & Shivashankar, S.A. MOCVD of ZrO2 films from bis(t-butyl-3-oxo-butanoato)zirconium(IV): some theoretical (thermodynamic) and experimental aspects. Bull Mater Sci 31, 67–72 (2008). https://doi.org/10.1007/s12034-008-0012-6
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s12034-008-0012-6