, Volume 56, Issue 10, pp 45–47 | Cite as

The pulse thermal processing of nanocrystalline silicon thin-films

  • R. D. Ott
  • P. Kadolkar
  • C. A. Blue
  • A. C. Cole
  • G. B. Thompson
Research Summary Nanomaterials And Surfaces


Pulse thermal processing (PTP) has the capability of processing thin-films and nanoparticles over broad areas utilizing high-density infrared plasma arc lamp technology. Heating rates reaching 600,000°C/s, which is orders of magnitude larger than current state-of-the-art rapid thermal annealing systems, are possible that allow controlled diffusion on the nanoscale. The ability to control heating at these levels permits processing thin-films and nanoparticles on temperature-sensitive substrates such as polymers. The PTP technique has been used to crystallize sputtered amorphous silicon thin-films on sapphire substrates.


Amorphous Silicon FePt Rapid Thermal Annealing Rapid Thermal Processing FePt Nanoparticle 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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  1. 1.
    A.D. Li et al., J. Crystal Growth, 235 (2002), p. 394.CrossRefGoogle Scholar
  2. 2.
    Y. Zhoa et al., Solar Energy Materials & Solar Cells, 62 (2000), p. 143.CrossRefGoogle Scholar
  3. 3.
    Z. Lin and Y.K. Lee, Materials Science in Semiconductor Processing, 3 (2000), p. 215.CrossRefGoogle Scholar
  4. 4.
    S. Berger, B.Z. Weiss, and Y. Komen, J. Appl. Phys., 67 (6) (1990), p. 3025.CrossRefGoogle Scholar
  5. 5.
    D.H. Levi et al., National Renewable Energy Laboratory/CP-530-23916 (July 1998).Google Scholar
  6. 6.
    J. Zou et al., J. Appl. Phys., 87 (9) (2000), p. 6869.CrossRefGoogle Scholar
  7. 7.
    J.H. Park et al., Thin Solid Films, 427 (2003), p. 303.CrossRefGoogle Scholar
  8. 8.
    R.E.I. Schropp, B. Stannowski, and J.K. Rath, J. Non-Crystalline Solids, 299–302 (2002), p. 1304.CrossRefGoogle Scholar
  9. 9.
    J.B. Boyce et al., J. Non-Crystalline Solids, 299–302 (2002), p. 731.CrossRefGoogle Scholar
  10. 10.
    B.P. Nelson et al., NCPV and Solar Program Review Meeting 2003, NREL/CD-520-33586 (Washington D.C.: U.S. Department of Energy, 2003).Google Scholar
  11. 11.
    Science and Technology Review (November 1999), Scholar
  12. 12.
    B.D. Cullity and S.R. Stock; Elements of X-ray Diffraction, 3rd ed. (Upper Saddle River, NJ: Prentice Hall Publ., 2001), p. 170.Google Scholar
  13. 13.
    F. Guang-Sheng et al., Chinese Phy., 12 (1) (2002), p. 75.CrossRefGoogle Scholar

Copyright information

© TMS 2004

Authors and Affiliations

  • R. D. Ott
    • 1
  • P. Kadolkar
    • 1
  • C. A. Blue
    • 1
  • A. C. Cole
    • 2
  • G. B. Thompson
    • 2
  1. 1.Oak Ridge National LaboratoryOak Ridge
  2. 2.the University of AlabamaTuscaloosa

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