JOM

, Volume 56, Issue 10, pp 45–47 | Cite as

The pulse thermal processing of nanocrystalline silicon thin-films

  • R. D. Ott
  • P. Kadolkar
  • C. A. Blue
  • A. C. Cole
  • G. B. Thompson
Research Summary Nanomaterials And Surfaces

Abstract

Pulse thermal processing (PTP) has the capability of processing thin-films and nanoparticles over broad areas utilizing high-density infrared plasma arc lamp technology. Heating rates reaching 600,000°C/s, which is orders of magnitude larger than current state-of-the-art rapid thermal annealing systems, are possible that allow controlled diffusion on the nanoscale. The ability to control heating at these levels permits processing thin-films and nanoparticles on temperature-sensitive substrates such as polymers. The PTP technique has been used to crystallize sputtered amorphous silicon thin-films on sapphire substrates.

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Copyright information

© TMS 2004

Authors and Affiliations

  • R. D. Ott
    • 1
  • P. Kadolkar
    • 1
  • C. A. Blue
    • 1
  • A. C. Cole
    • 2
  • G. B. Thompson
    • 2
  1. 1.Oak Ridge National LaboratoryOak Ridge
  2. 2.the University of AlabamaTuscaloosa

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