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Performance of inverted organic photovoltaic cells with nitrogen doped TiO2 films by atomic layer deposition

  • Materials (Organic, Inorganic, Electronic, Thin Films)
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Abstract

Atomic layer deposition (ALD) was used to synthesize titanium oxide (TiO2) film as an electron transport layer (ETL) in inverted organic photovoltaic cells (IOPVs). By adjusting the ALD precursor ratio and deposition temperature, the thickness of the TiO2 film was 5 nm, and its effect on the photovoltaic performances was evaluated. We also investigated the effect of nitrogen doping of TiO2 on the power conversion efficiency (PCE) of the cells. An IOPV cell fabricated with a 0.6%-nitrogen-doped TiO2 (N-TiO2 A) ETL exhibited a PCE of 2.27%, which is a 6% increase compared with an equivalent cell containing an undoped TiO2 ETL. Furthermore, the XPS results confirmed the doping of nitrogen into the samples. The doping improved the electrical properties of the TiO2 films evidenced by the Hall measurements in terms of conductivity, hall electron mobility and carrier density.

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Authors and Affiliations

  1. School of Chemical Engineering, Chonnam National University, 300 Youngbong-dong, Gwangju, 61186, Korea

    Muhammad Zafar & Do-Heyoung Kim

  2. Center for Vacuum, Korea Research Institute of Standards and Science, 267 Gajeong-ro, Daejeon, 34113, Korea

    Ju-Young Yun

Authors
  1. Muhammad Zafar
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  2. Ju-Young Yun
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  3. Do-Heyoung Kim
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Correspondence to Do-Heyoung Kim.

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Zafar, M., Yun, JY. & Kim, DH. Performance of inverted organic photovoltaic cells with nitrogen doped TiO2 films by atomic layer deposition. Korean J. Chem. Eng. 35, 567–573 (2018). https://doi.org/10.1007/s11814-017-0285-9

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  • DOI: https://doi.org/10.1007/s11814-017-0285-9

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