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Optimal design of multi-nozzle etching process for shadow mask

  • Process Systems Engineering, Process Safety, Transport Phenomena
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Abstract

This paper presents a new design approach of a multi-nozzle etching process which is the core system for the production of a shadow mask. The shadow mask, which is a thin metal plate with a huge number of small holes in regular patterns, is a key component of televisions and computer monitors. The shadow mask plays an important role in controlling the definition, color and distinction of televisions and computer monitors. Thus, the development of a rigorous and systematic design method for a multi-nozzle etching process to manufacture the shadow mask is beneficial particularly from the viewpoint of increasing efficiency and improving productivity. The proposed design method is based on simulating the complex spraying pattern using a Monte-Carlo method, whereas a stochastic method, so-called genetic algorithm, is used for an optimization tool. In such a highly complex solution space, the genetic algorithm searches optimal solutions efficiently and effectively. The simulation of spraying pattern for the multi-nozzle system and the genetic algorithm are coded by C language, while the graphic representations are attained by MATLAB graphic tools.

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References

  1. R. B. Maynard, J. J. Moscony and M.H. Saunders, Ferric chloride etching of low carbon steels, RCA Rev., 45, 73 (1984).

    CAS  Google Scholar 

  2. R. B. Maynard, J. J. Moscony and M.H. Saunders, Ferric chloride etching of Invar, RCA Rev., 47, 88 (1986).

    CAS  Google Scholar 

  3. G. J. Kwon, H.Y. Sun and H. J. Sohn, J. Electrochem. Soc., 142, 3016 (1995).

    Article  CAS  Google Scholar 

  4. M. Hariki, A. Nishi and M. Morita, Tetsu-to-hagané., 83, 257 (1997).

    CAS  Google Scholar 

  5. G. E. Mccreery and C. M. Stoots, Int. J. Multiphase Flow, 22, 431 (1996).

    Article  CAS  Google Scholar 

  6. M. Sommerfield and H.H. Qiu, Int. J. Heat Fluid Fl., 19, 10 (1998).

    Article  Google Scholar 

  7. M. V. Panchagnula and P. E. Sojka, Fuel, 78, 729 (1999).

    Article  CAS  Google Scholar 

  8. J. H. Holland, Adaptation in natural and artificial systems, University of Michigan Press, MI (1975).

    Google Scholar 

  9. D. E. Goldberg and R. Lingle, Proceedings of the International Conference on Genetic Algorithms and Their Applications, 154 (1985).

  10. D. E. Goldberg, Engineering with Computers, 3, 35 (1987).

    Article  Google Scholar 

  11. D. E. Goldberg, Genetic algorithms in search, optimization and machine learning, Addison-Wesley Publishing Co. (1989).

  12. G. J. E. Rawlins, Foundation of genetic algorithms, Morgan Kanfmann Publishers, San Mateo (1991).

    Google Scholar 

  13. L. Davis, Genetic algorithms and simulated annealing, Morgan Kanfmann Publishers, San Mateo (1987).

    Google Scholar 

  14. J.H. Jung, C.H. Lee and I. B. Lee, Comput. Chem. Eng., 22, 1725 (1998).

    CAS  Google Scholar 

  15. L. Davis, Handbook of genetic algorithms, Van Nostrand ReinHold, New York (1991).

    Google Scholar 

  16. Y. Davidor, Genetic algorithms and robotics: A heuristic strategy for optimization, World Scientific, Singapore (1991).

    Google Scholar 

  17. S. Park, H. Cho, H. Lee and L. Jeon, ’92 KACC (Domestic) at Seoul, 863 (1992).

  18. Y. Kim, H. Kang and H. Jeon, ’92 KACC (Domestic) at Seoul, 698 (1992).

  19. K. A. De Jong, Proceedings of the International Conference on Genetic Algorithms and Their Application, 210 (1995).

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Correspondence to Jae Hak Jung.

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Seo, M., Park, J.S., Park, S. et al. Optimal design of multi-nozzle etching process for shadow mask. Korean J. Chem. Eng. 26, 1519–1527 (2009). https://doi.org/10.1007/s11814-009-0318-0

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  • DOI: https://doi.org/10.1007/s11814-009-0318-0

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