Abstract
Tantalum pentoxide (Ta2O5) and ultraviolet reflective (UVR) multilayer films were deposited on quartz glass substrates by an electron beam evaporation system equipped with a hall ion source, respectively. The optical properties of Ta2O5 film and the UVR film under the vacuum ultraviolet irradiation were investigated. It is found that the mean transmittance of the Ta2O5 thin film decreased in the 300–500 nm region. The refractive index and extinction coefficient of the single layer increased during the range of 300–1 000 nm, with the variation rate of refractive index less than 1%, which is mainly due to the larger surface roughness and variation of the chemical state of Ta atoms on the surface caused by the irradiation. The mean reflectance of UVR film decreased from 96.5% to 95.4% during the range of 290–450 nm, indicating that the Ta2O5 and UVR films have excellent vacuum ultraviolet irradiation resistant properties.
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References
Sharma N, Kumar VP, Kumar M, Kumari N, Karar V and Goswamy JK, Optik 202, 163697 (2020).
Mannequin C, Tsuruoka T, Hasegawa T and Aono M, Applied Surface Science 385, 426 (2016).
Bright TJ, Watjen JI, Zhang ZM, Muratore C, Voevodin AA and Koukis DI, Journal of Applied Physics 114, 083515 (2013).
Shakoury R, Rezaee S, Mwema F, Luna C, Ghosh K and Jurečka S, Optical and Quantum Electronics 52, 95 (2020).
Sertel T, Sonmez NA, Cetin SS and Ozcelik S, Ceramics International 45, 11 (2019).
Lee C-C and Jan D-J, Thin Solid Films 483, 130 (2005).
Korkos S, Xanthopoulos NJ, Botzakaki MA, Drivas C, Kennou S and Ladas S, Journal of Vacuum Science & Technology A 38, 032402 (2020).
Pellicori SF, Martinez CL, Hausgen P and Wilt D, Applied Optics 53, A339 (2014).
Marshall CD, Speth JA and Payne SA, Journal of Non-Crystalline Solids 212, 59 (1997).
Chen X, Bai R and Huang M, Optical Materials 97, 109404 (2019).
Chaneliere C, Autran JL, Devine RAB and Balland B, Materials Science & Engineering R-Reports 22, 269 (1998).
Shakoury R and Willey RR, Applied Optics 55, 5353 (2016).
Di Sarcina I, Grilli ML, Menchini F, Piegari A, Scaglione S and Sytchkova A, Applied Optics 53, A314 (2014).
Leyderman A, Weil JA and Williams JAS, Journal of Physics and Chemistry of Solids 46, 519 (1985).
Xu LM, Zhou H, Zhang KF, Zheng J, Li K and Wang JZ, Journal of Infrared and Millimeter Waves 37, 11 (2018).
Stenzel O, Wilbrandt S, Schlegel R, Böhme M and Kaiser N, Thin Solid Films 542, 295 (2013).
Huang TW, Lee HY, Hsieh YW and Lee CH, Journal of Crystal Growth 237, 492 (2002).
Atanassova E and Spassov D, Applied Surface Science 135, 71 (1998).
Simpson R, White RG, Watts JF and Baker MA, Applied Surface Science 405, 79 (2017).
Tsuchiya T, Imai H, Miyoshi S, Glans PA, Guo J and Yamaguchi S, Physical Chemistry Chemical Physics 13, 17013 (2011).
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This work has been supported by the Joint Astronomical Fund of National Science Foundation of China (No.U1731113), and the Foundation of Science and Technology on Vacuum Technology and Physics Laboratory (No.ZD171902).
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Xu), L., He, Y., Li, K. et al. Optical properties of Ta2O5 single layer and ultraviolet reflective film under ultraviolet irradiation. Optoelectron. Lett. 17, 464–467 (2021). https://doi.org/10.1007/s11801-021-0157-8
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DOI: https://doi.org/10.1007/s11801-021-0157-8