Abstract
The matrix polymer PTBCHNB bearing o-nitrobenzyl group was successfully synthesized by copolymerization of tertiary-butyl methacrylate (TBMA), cyclohexyl methacrylate (CHMA) and o-nitrobenzyl methacrylate (NBMA) via reversible addition fragmentation chain transfer (RAFT) polymerization method. PTBCHNB was characterized by FTIR, 1HNMR, GPC and DSC. After UV irradiation, the o-nitrobenzyl groups of PTBCHNB were photocleaved and the resulting carboxyl groups were highly alkali soluble, and PTBCHNB was converted to PCHIBMA bearing carboxyl groups. So, the matrix polymer could be etched by mild alkali solution with no requirements of photoacid generators and other diverse additives. The photocleavable behaviors of PTBCHNB were determined by FTIR, 1H NMR and TGA analysis. The resist formulated with PTBCHNB and cast in THF solution showed square pattern of 10 μm×10 μm using a mercury-xenon lamp in a contact printing mode and tetramethyl-ammonium hydroxide aqueous solution as a developer.
Similar content being viewed by others
References
LIU Juan, LIU Zheng-ping, WANG Li-yuan, SUN Hai-yan. Single-component chemically amplified i-line molecular glass photoresist based on calix resorcinarenes [J]. Chinese Science Bulletin, 2014, 59(11): 1097–1103.
NASSIR M, DANIEL F, JENS G, YASIN E. Broadband interference lithography at extreme ultraviolet and soft X-ray wavelengths [J]. Optics Letters, 2014, 39(8): 2286–2289.
DIAKOUMAKOS C D, RAPTIS I, TSEREPI A, ARGITIS P. Free-radical synthesis of narrow polydispersed 2-hydroxyethyl methacrylate-based tetrapolymers for dilute aqueous base developable negative photoresists [J]. Polymer, 2002, 43(4): 1103–1113.
CHAE K H, SUN G J, KANG J K, KIM T H. A water-developable negative photoresist based on the photocrosslinking of N-phenylamide groups with reduced environmental impact [J]. Journal of Applied Polymer Science, 2002, 86(5): 1172–1180.
KIM J B, JANG, J H, KO J S, CHOI, J H, LEE K K. Environmentally friendly negative resists based on acid-catalyzed acetalization for 193-nm lithograph [J]. Macromolecular Rapid Communications, 2003, 24(15): 879–882.
CHOI N, KIM J H, KIM Y H, KIM T S. Improved lithographic performance with ultra-thin 193 nm resist [J]. Journal of Photopolymer Science and Technology, 2006, 19(3): 313–318.
KIM J B, LEE J J. Synthesis and characterization of norbomene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists [J]. Polymer, 2002, 43(6): 1963–1967.
PASQUALE A J, LONG T E, TRUONG H, ALLEN R D. Investigations of the adhesion of maleic anhydride/cyclic olefin alternating copolymers to silicon substrates: Improved materials for 193 nm lithography [J]. Journal of Adhesion, 2002, 78(1): 1–13.
KIM H W, LEE S, CHOI S J, WOO S G, CHAE Y S, KIM J S. Application of VEMA type ArF resist to sub-100 nm lithography [J]. Journal of Photopolymer Science and Technology, 2002, 15(3): 529–534.
KIM J B, YUN H J, KWON Y G. Novel molecular resist based on derivative of cholic acid [J]. Chemistry Letters, 2002, 31(10): 1064–1065.
GAO Qiong-zhi, LI Hong-qiang, ZENG Xing-rong. UV curing of hyperbranched polyurethane acrylatepolyurethane diacrylate/SiO2 dispersion and TGA/FTIR study of cured films [J]. Journal of Central South University, 2012, 19: 63–70.
ZHI L, UWE B, THOMAS A. Towards quantitative modelling of surface deformation of polymer micro-structures under tactile scanning measurement [J]. Measurement Science and Technology, 2014, 25(4): 1–7.
BOCHET C G. Photolabile protecting groups and linkers [J]. Journal of the Chemical Society, Perkin Transactions, 2002, 2: 125–142.
SHIN G J, JUNG J C, CHI J H, OH T H, KIM J B. Synthesis and micropatterning properties of a novel base-soluble, positive-working, photosensitive polyirnide having an o-nitrobenzyl ether group [J]. Journal of Polymer Science Part A: Polymer Chemistry, 2007, 45(5): 776–788.
CHOI O J, CHUNG M K, RYU Y M, LEE M H. Synthesis and characterization of new positive photosensitive polyimide having photocleavable 4,5-dimethoxy-2-nitrobenzyl (DMNB) groups[J]. Polymer-Korea, 2002, 26: 701–709.
DOH J, IRVINE D J. Photogenerated polyelectrolyte bilayers from an aqueous-processible photoresist for multicomponent protein patterning [J]. Journal of the American Chemical Society, 2004, 126(30): 9170–9171.
IONOV L, DIEZ S. Environment-friendly photolithography using poly (N-isopropylacrylamide)-based thermoresponsive photoresists [J]. Journal of the American Chemical Society, 2009, 131(37): 13315–13319.
CHANG Li-min, LI Ying, CHU Jia, QI Jing-yao, LI Xin. Preparation of core-shell molecularly imprinted polymer via the combination of reversible addition-fragmentation chain transfer polymerization and click reaction [J]. Analytica Chimica Acta, 2010, 680(1/2): 65–71
ZHAO Xiao-fang. Preparation of acrylate matrix resin and application as photoresist [D]. Nanjing: School of Chemistry and Chemical Engineering, Southeast University, 2012: 33. (in Chinese)
Author information
Authors and Affiliations
Corresponding author
Additional information
Foundation item: Project(2008AA03323) supported by the High-Tech Research and Development of China; Project(21374016) supported by the National Natural Science Foundation of China; Project(BY201153) supported by Production, Forward-Looking Joint Research Project of Jiangsu Province, China
Rights and permissions
About this article
Cite this article
Guo, Lx., Guan, J., Lin, Bp. et al. Synthesis and characterization of methacrylate matrix resin bearing o-nitrobenzyl group. J. Cent. South Univ. 22, 3296–3301 (2015). https://doi.org/10.1007/s11771-015-2869-z
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11771-015-2869-z