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Structural and hardness studies of CN X /TiN composite coatings on Si (100) substrates by laser ablation method

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Abstract

CN x /TiN composite coatings were deposited on Si (100) substrates using the pulsed laser deposition (PLD) method. Previous results showed that a seed of titanium nitride (TiN) layer between silicon substrates and a top layer of carbon nitride increased the hardness and modulus values of overall composite coatings (Ref 1). This paper describes the same approach to growing carbon nitride composite coatings with varying thicknesses of different kinds of buffer layers and carbon nitride films on Si (100) substrates at different temperatures and pressures. Preliminary results showed the presence of carbon nitride films by the Fourier transform infrared spectroscopy (FTIR) method. The mechanical properties of the films were characterized using the nanoindentation technique. The crystallographic properties of the films were characterized using the x-ray diffractometer method.

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Authors and Affiliations

  1. University of South Alabama, Mobile, AL, USA

    A. Kumar & H. L. Chan

  2. University of Tennessee Space Institute, Tullahoma, TN, USA

    N. B. Dahotre

Authors
  1. A. Kumar
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  2. H. L. Chan
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  3. N. B. Dahotre
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Kumar, A., Chan, H.L. & Dahotre, N.B. Structural and hardness studies of CN X /TiN composite coatings on Si (100) substrates by laser ablation method. J. of Materi Eng and Perform 6, 583–585 (1997). https://doi.org/10.1007/s11665-997-0047-7

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  • DOI: https://doi.org/10.1007/s11665-997-0047-7

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