Skip to main content
SpringerLink
Log in

Microstructure and Magnetron Sputtering Properties of W/Re Alloy Targets Fabricated by Vacuum Sintering

  • Published:
Journal of Materials Engineering and Performance Aims and scope Submit manuscript

Abstract

To develop high-quality refractory metal targets, pure W and W/Re alloys (with Re contents of 1, 5 and 10 mass%) were fabricated via mechanical mixing, press forming and vacuum sintering. Properties such as relative density, grain size and orientation, and magnetron sputtering characteristics were investigated in the W/Re alloys. With increasing Re content, both the relative density and purity of the W-Re alloys increased, while the grain size decreased. The sizes of the grains in the W/10 mass% Re alloy target were mainly between 10 and 40 μm. The results of electron backscatter diffraction (EBSD) indicated that the grains in the W/Re alloys were randomly distributed and did not have a preferred orientation. The percentage of small-angle grain boundaries (< 10°) was greater than 85% in the W/10 mass% Re alloy. The grains in W/Re alloy thin films became gradually refined with increasing deposition pressure during magnetron sputtering. Additionally, the surface roughness of the thin films gradually decreased and the thickness of the thin films gradually increased with increasing deposition pressure. X-ray diffraction (XRD) patterns of the thin films exhibited (110), (200) and (211) diffraction peaks at 40.5°, 58.6° and 73.5°, respectively. With increasing deposition pressure, the intensity of the (110) diffraction peak gradually decreased, while the intensity of the (200) diffraction peak gradually increased.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7
Fig. 8
Fig. 9
Fig. 10
Fig. 11
Fig. 12
Fig. 13
Fig. 14

Similar content being viewed by others

References

  1. Y. Yu, J.P. Song, F. Bai, A.L. Zheng and F.S. Peng, Ultra-high Purity Tungsten and Its Applications, Int. J Refract. Met. Hard Mater., 2015, 53, p 98–103.

    Article  CAS  Google Scholar 

  2. X.Y. Wei, Preparation Technology and Application of High Purity Tungsten Target for Semiconductor, Cemented Carbide, 2017, 34, p 353–359.

    Google Scholar 

  3. F. Bai, The Study of Preparing of High Purity Tungsten Alloy Targets, A Dissertation Submitted to Xiamen University for Master Degree of Materials Engineering, Xiamen: Xiamen University, 2015, p 40-43

  4. Y.Z. Ma, Y. Liu, W.S. Liu and L.P. Long, Preparation Procedure of High Purity Tungsten Via Electron Beam Side Surface Melting, Mater. Sci. Technol., 2014, 22, p 30–35.

    CAS  Google Scholar 

  5. Z.H. Wang, M.X. Wang, M.Y. Chu, F. Guo, X. Zhao and J.Y. Shen, Preparation of W-Ti Sputtering Targets under Inert Atmosphere, Chin. J. Rare Met., 2006, 30, p 687–691.

    Article  Google Scholar 

  6. Z.C. Ding, M. Chen, S.Q. Liu, X.P. Wang and B.G. Lv, Preparation of High Purity W-Si Alloy Powder, Rare Metal Mat. Eng., 2014, 43, p 1269–1271.

    CAS  Google Scholar 

  7. Z.C. Ding, J.J. He, J.F. Luo, Y.J. Li and X.D. Xiong, Effects of Vacuum Hot Pressing Sintering on the Performance of High Purity W-Si Alloy Target, Rare Metal Mat. Eng., 2014, 43, p 1403–1406.

    CAS  Google Scholar 

  8. Q.X. Wang and Z.K. Fan, Application and Manufacturing Technology of Tungsten and Tungsten-titanium Targets, Powder Metall. Technol., 2009, 27, p 52–57.

    CAS  Google Scholar 

  9. Y.M. Wang, Q.H. Tang, D.Q. Chen, X.B. Liu, J.H. Yan and X. Xiong, Microstructure and Magnetron Sputtering Properties of Tungsten Target Fabricated by Low Pressure Plasma Spraying, Int. J. Refract. Met. Hard Mater., 2020, 87(105116), p 1–10.

    CAS  Google Scholar 

  10. Y.M. Wang, Q.H. Tang, Z.Q. Yan and F. Wang, Influence of Vacuum Chamber Pressure on Microstructure and Properties of Tungsten Target Fabricated by Low Pressure Plasma Spraying, J. Mater. Eng., 2018, 46, p 104–112.

    Article  Google Scholar 

  11. B. Gao, L.F. Shao and H.F. Zhang, Preparation and Properties of Metal Tungsten Sputtering Target, World Nonferr. Met., 2017, 33, p 249–250.

    Google Scholar 

  12. A.R. Lipski and R.S. Lefferts, Making Tungsten Targets Using Tungsten Oxide Powder, Nucl. Instrum. Methods Phys. Res. Sect. A, 2011, 655, p 41–43.

    Article  CAS  Google Scholar 

  13. Y.Z. Jin, D.L. Liu and J. Chen, Studying on Manufacture and Application of Sputtering Target Materials, J. Sichuan Univ. Sci. Eng. Nat. Sci. Ed., 2005, 18, p 22–24.

    Google Scholar 

  14. A.H. Yang, Y. Zhu, Z.M. Deng, H.C. Xie, G.Q. Zhang and F. Wu, Investigation on Microstructure and Texture in High Pure Gold Sputtering Targets by EBSD, Precious Metal., 2014, 35, p 44–48.

    Google Scholar 

  15. Y.Q. Xia, D.C. Wang, J.S. Wang, E.K. Zhu and S.L. Yin, Study on High Temperature Molybdenum Alloy Doped with Rare-earth Element, Chin. Molybden. Indus., 2001, 25, p 76–78.

    Google Scholar 

  16. S.E. Hornstrom, T. Lin, O. Thomas, P.M. Fryer and J.M.E. Harper, Tungsten-rhenium Alloys as Diffusion Barriers between Aluminum and Silicon, J. Vacuum Sci. Technol., 1988, 6, p 1650–1655.

    Article  CAS  Google Scholar 

  17. H. Lange, W. Möhling and G. Marxsen, W-Re (6 wt.%) and W-Ti (10 wt.%) Alloys as Diffusion Barriers between Aluminum and Silicon, Thin Solid Films, 1991, 205, p 47-51

  18. S.O. Safonov, V.P. Bespalov, A.A. Golishnikov and M.G. Putrya, Estimating the Reliability of Aluminum Metallization of Integrated Circuits by Accelerated Electromigration Testing at Constant Temperature, Russ. Microelectron., 2015, 44, p 453–459.

    Article  CAS  Google Scholar 

  19. I. De Munari, A. Scorzoni, F. Tamarri and D. Govoni, Drawbacks to Using NIST Electromigration Test-structures to Test Bamboo Metal Lines, IEEE Trans. Electron Dev., 1994, 41, p 2276–2280.

    Article  CAS  Google Scholar 

  20. T.Y. Cheng, N. Xiong, K.Y. Peng, H.B. Yang and J.C. Yin, The Aplication and Preparation Technology of Rhenium and Rhenium Alloys, Rare Metal Mat. Eng., 2009, 38, p 373–376.

    Article  CAS  Google Scholar 

  21. H.Z. Wang and S.L. Yang, Character, Application and Preparation Method of Rhenium, J Chin. Rare Earth Soc., 2005, 23, p 189–193.

    Google Scholar 

  22. Z.Q. Cui and B.X. Liu, Metallurgy and Heat Treatment Principle, Haerbin Institute of Technology Press, Haerbin, 1998.

    Google Scholar 

  23. J.J. Park, Creep Strength of a Tungsten–rhenium–hafnium Carbide Alloy from 2200 to 2400 , Mater. Sci. Eng. A, 1999, 265, p 174–178.

    Article  Google Scholar 

  24. K. Yang, B. Cao and W.J. Yu, Precise Resistance Spot Welding of Automotive Lamp, Electr. Weld. Mach., 2010, 40, p 139–141.

    CAS  Google Scholar 

  25. A. H. Luo, and D. L. Jacobson, Creep Behavior of a Tungsten-3.6%rhenium-0.33%zirconium Carbide Alloy, Int. J. Refract. Met. Hard Mater., 1992, 11, p 97-103

  26. L.Y. Wang, C.Z. Wang, J. Ma and Y.Y. Hou, The Technics of W-Re Alloy Coating by Chemical Vapor Deposition, China Surf. Eng., 2006, 19, p 39–42.

    Google Scholar 

  27. Y.M. Wang, M.H. Chen, Y. Li, K.W. Tang, W.W. Ding, X. Xiong, Q.L. Shi, L. Xie and X. Xu, Near-net-shape Tungsten-rhenium Alloy Parts Produced by Shrouded Plasma Spray Forming, J. Aeronaut. Mater., 2016, 36, p 24–34.

    Google Scholar 

  28. Y.M. Wang, X. Xiong, Z.W. Zhao, X. Lu, J.H. Yan, X.B. Min and F. Zheng, Near-net-shape Tungsten-rhenium Alloy Parts Produced by Plasma Spray Forming and Hot Isostatic Pressing, Mater. Trans., 2014, 55, p 713–721.

    Article  CAS  Google Scholar 

  29. S. Pramanik, A. K. Srivastav, B. Manuel Jolly, N. Chawake, and B. S. Murty, Effect of Re on Microstructural Evolution and Densification Kinetics During Spark Plasma Sintering of Nanocrystalline W, Adv. Powder Technol., 2019, 30, p 2779-2786

  30. C.F. Lo, P. Mcdonald, D. Draper and P. Gilman, Influence of Tungsten Sputtering Target Density on Physical Vapor Deposition Thin Film Properties, J. Electron. Mater., 2005, 34, p 1468–1473.

    Article  CAS  Google Scholar 

  31. T. Leonhardt, C. Trybus and R. Hickman, Consolidation Methods for Spherical Rhenium and Rhenium Alloys, Powder Metall., 2003, 46, p 148–153.

    Article  CAS  Google Scholar 

  32. R.I. Jaffee, C.T. Sims, and J. J. Hardwood, The Effect of Rhenium on the Fabrication and Ductility of Molybdenum and Tungsten, In Proceedings of 3rd Plansee-Seminar Proceedings (Reutte, Austria: Plansee Group), 1958, p 380-410

  33. K. Johann, L. Alexander, K. Daniel, C. Helmut, and M.K. Verena, Thermally Activated Deformation Mechanisms and Solid Solution Softening in W-Re Alloys Investigated via High Temperature Nanoindentation, Mater. Design, 2020, 189, p (108499)1-6

  34. H. Wang, M.X. Xia, Y.C. Li, X.F. Liu, X.M. Cai, R. Bai and X. Zhang, Treatment of Ammonia Nitrogen Waste Water from Tungsten Smelter by Breakpoint Chlorination, Chin. Tungsten Indus., 2019, 34, p 64–69.

    Google Scholar 

  35. Z.J. Liu, Y.X. Chen, W.J. Huang and H.J. Huang, Manufacture and Application of Sputtering Target Materials, South. Metal., 2003, 23, p 23–25.

    Google Scholar 

  36. Q. Tan, Manufacture and Application of Mo-Re Alloys, Chin. Molybden. Indus., 1998, 22, p 26–28.

    Google Scholar 

  37. X.S. Yin, Tungsten/Rhenium Alloy and Tungsten/Rhenium Thermocouple, Metall. Indus. Press, Beijing, 1992, p 7

    Google Scholar 

  38. C. Guan, J.J. He, H. Zeng, X.Y. Wang and Y.J. Li, Microstructure and Texture Evolution of Ultra-high Pure CuMn Alloy Material, Chin. Rare Metal., 2017, 41, p 120–125.

    Google Scholar 

  39. C.B. Wei, M.J. Dai, H.J. Hou, S.S. Lin and L. Zhao, Influence of Deposition Pressure on Structure and Tribological Properties of W-S-C Composite Films, Lubr. Eng., 2012, 37, p 69–73.

    CAS  Google Scholar 

  40. J.T. He, H.C. Cai and Y.J. Xue, Effect of Deposition Pressure on Tribological Properties of WS2 Films by Magnetron Sputtering, Surf. Technol., 2020, 49, p 180–187.

    Google Scholar 

Download references

Acknowledgments

This work was supported by National Natural Science Foundation of China (Grant No. 51701072 and Grant No. 52011530147), Natural Science Foundation of Hunan Province of China (Grant No. 2016JJ5029, 2017JJ3088 and 2020JJ4738), Military and Civilian Integration Industry Development Special Foundation of Hunan Province (Grant No. 2016B116J1), National United Engineering Laboratory for Advanced Bearing Tribology (Henan University of Science and Technology, Grant No. 201913) and Hunan Province Key Laboratory of Materials Surface & Interface Science and Technology (Central South University of Forestry and Technology, Grant No. KFBJM2019002).

Author information

Authors and Affiliations

  1. Hunan Provincial Key Defense Laboratory of High Temperature Wear-Resisting Materials and Preparation Technology, Hunan University of Science and Technology, Xiangtan, 411201, China

    Y. M. Wang, Q. H. Tang & P. Zhou

  2. Hunan Provincial Key Laboratory of Advanced Materials for New Energy Storage and Conversion, Hunan University of Science and Technology, Xiangtan, 411201, China

    Y. M. Wang, Q. H. Tang & P. Zhou

Authors
  1. Y. M. Wang
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Q. H. Tang
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. P. Zhou
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Y. M. Wang.

Additional information

Publisher's Note

Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Wang, Y.M., Tang, Q.H. & Zhou, P. Microstructure and Magnetron Sputtering Properties of W/Re Alloy Targets Fabricated by Vacuum Sintering. J. of Materi Eng and Perform 30, 7223–7235 (2021). https://doi.org/10.1007/s11665-021-05907-w

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s11665-021-05907-w

Keywords

Search

Navigation