Abstract
Low temperature thermal treatments of CdHgTe, normally in the presence of mercury vapor, are still used on both bulk samples and single and multi-layer epitaxial layers to modify or control the electrical properties. This paper reviews the recent literature reports in this area and develops the existing model to explain certain features of the p to n conversion process. A brief update on compositional interdiffusion at low temperatures is given which shows significant disagreement within literature values. In addition, the paper will describe and comment on some as yet unexplained results (interdiffusion and electrical behavior) following low temperature treatments in both liquid phase and metalorganic vapor phase epitaxial (LPE and MOVPE) layers.
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C.L. Jones, M.J.T. Quelch, P. Capper and J.J.G. Gosney, J. Appl. Phys. 53, 9080 (1982).
D. Shaw, Properties of Narrow Gap Cadmium-based Compounds, EMIS Datareview Series No. 10, ed. Peter Capper, INSPEC/IEE, London, UK, 1994) section A4.2.
H.F. Schaake, J.H. Tregilgas, J.D. Beck, M.A. Kinch and B.E. Gnade, J. Vac. Sci. Technol. A 3, 143 (1985).
V.V. Bogoboyashsii, A.I. Elizarov, V.I. Ivanov-Omskii, V.R. Petrenko and V.A. Petryakov, Sov. Phys.-Semicond. 19, 505 (1985).
A. McAllister, E. O’Keefe, P. Capper, F.A. Capocci, S. Barton and D.T. Dutton, J. Electron. Mater. 25, 1014 (1996).
P. Capper, B.C. Easton, P.A.C. Whiffin and C.D. Maxey, J. Cryst. Growth 79, 508 (1986).
S.W. Moon, S.H. Suh and C.S. Choi, J. Cryst. Growth 138, 944 (1994).
Z. Kawazu, S. Ochi, T. Sonoda and S. Takamiya, J. Electron. Mater. 24, 1113 (1995).
D.T. Dutton, E. O’Keefe, P. Capper, C.L. Jones, S. Mugford and C. Ard, Semicond. Sci. Technol. 8, S266 (1993).
T.C. Harman, J. Vac. Sci. Technol. A 5, 3055 (1987).
J.L. Melendez and C.R. Helms, J. Electron. Mater. 24, 565 (1995).
J.L. Melendez and C.R. Helms, J. Electron. Mater. 24, 573 (1995).
S.L. Holander, H.G. Robinson and C.R. Helms, Mater. Res. Soc. Symp. Proc. 389, (Pittsburgh, PA: Mater. Res. Soc., 1995), p. 47.
S. Holander-Gleixner, H.G. Robinson and C.R. Helms, J. Appl. Phys. 83, 1299 (1998), and references therein.
P. Koppel and K. Owens, J. Appl. Phys. 67, 6886 (1990).
D. Shaw, Semicond. Sci. Technol. 12, 761 (1997).
M. Neubert and K. Jacobs J. Cryst. Growth 161, 229 (1996).
D. Shaw and P. Capper (to be published).
N.A. Archer, H.D. Palfrey and A.F.W. Willoughby, J. Electron. Mater. 22, 967 (1993).
H.R. Vydyanath, J. Vac. Sci. Technol. B 9, 1716 (1991).
D. Shaw, J. Electron. Mater. 24, 587 (1995).
B.I. Boltaks Diffusion in Semiconductors (Infosearch, London 1963).
C.R. Helms, J.L. Melendez, H.G. Robinson, S. Holander, J. Hasan and S. Halpete, J. Electron. Mater 24, 1137 (1995).
M.A. Berding, M. van Schilfgaarde and A. Sher, Phys. Rev. B. 50, 1519 (1994).
M.A. Berding, A. Sher and M. van Schilfgaarde, J. Electron. Mater. 24, 1127 (1995).
J.L. Melendez, J. Tregilgas, J. Dodge and C.R. Helms, J. Electron. Mater. 24, 1219 (1995).
H.F. Schaake, J.H. Tregilgas, J.D. Beck and M.A. Kinch, Solid State Commun. 50, 133 (1984).
P. Capper, I. Kenworthy, C.L. Jones and J.A. Roberts (unpublished work).
H.R. Vydyanath, J. Electrochem. Soc. 128, 2609 (1981).
H.R. Vydyanath and C.H. Hiner, J. Appl. Phys. 65, 3080 (1989).
R. Krause-Rehberg, H.S. Leipner, T. Abgarjan and J. Polity, Appl. Phys. A 66, 599 (1998).
M. Neubert, K. Jacobs, R. Krause-Rehberg, T. Abgarjan, P. Gille and W. Hoerstel, J. Appl. Phys. 79, 7563 (1996).
C.D. Smith, P. Rice-Evans, Phys. Rev. Lett. 72, 1108 (1994).
S.D. Yoo and K.D. Kwack, J. Appl. Phys. 83, 2586 (1998).
P. Capper, E. O’Keefe, C. Maxey, D.T. Dutton, P. Mackett, C. Butler and I. Gale, J. Cryst. Growth 161, 104 (1996).
M.A. Berding, M. van Schilgaarde and A. Sher, J. Electron. Mater. 22, 1005 (1993).
J.S. Chen, PhD Thesis, University of Southern California (1985).
D. Shaw, in Widegap II–VI Compounds for Opto-electronic Applications ed. H.E. Ruda (Chapman & Hall, 1992) ch. 10.
V.M. Vorob’ev, V.A. Murav’ev and V.A. Panteleev, Sov. Phys.-Solid State 23, 2055 (1981).
C.E. Jones, V. Nair and D. Polla, Appl. Phys. Lett., 39, 248 (1981).
V.C. Lopes, A.J. Syllaios and M.C. Chen, Semicond. Sci. Technol. 8, 824 (1993).
M. Hanke, D. Hennig and A. Kaschte, Acta Phys. Polon. A 77, 125 (1990).
H.R. Vydyanath, J. Electron. Mater. 24, 1275 (1995).
J.-L, Staudenmann, R.D. Knox and J.-P. Faurie, J. Vac. Sci. Technol. A 5, 3161 (1987).
Y. Kim, A. Ourmazd and R.D. Feldman, J. Vac. Sci. Technol. A 8, 1116 (1990).
A. Tardot, A. Hamoudi, N. Magnea, P. Gentile and J.L. Pautrat, Semicond. Sci. Technol. 8, S276 (1993).
M.A. Mattson, T.H. Myers, M. Richards-Babb and J.R. Meyer, J. Electron. Mater. 26, 578 (1997).
M.S. Han, S.R. Hahn, H.C. Kwon, Y. Bin, T.W. Kwang, J.H. Leem, Y.B. Hou, H.C. Jeon, J.K. Hyun, Y.T. Jeoung, H.K. Kim, J.M. Kim and T.W. Kim, J. Electron. Mater. 27, 680 (1998).
A. Lusson, R. Druilhe, Y. Marfaing and E. Rzepka, Semicond. Sci. Technol. 8, S197 (1993).
N. Mainzer, D. Shilo, E. Zolotoyabko, G. Bahir, A. Sher, K. Cytermann and R. Brener, J. Appl. Phys. 82, 2869 (1997).
E.D. Jones, V. Thambipillai and J.B. Mullin, J. Cryst. Growth 118, 1 (1992).
M.U. Ahmed, E.D. Jones, J.B. Mullin and N.M. Stewart, J. Cryst. Growth 159, 1141 (1996).
M.U. Ahmed, E.D. Jones, J.B. Mullin and N.M. Stewart, J. Cryst. Growth 161, 223 (1996).
B.W. Ludington, Mater. Res. Soc. Symp. Proc. 90, 437 (1987).
S. Holander-Gleixner, H.G. Robinson and C.R. Helms J. Electron. Mater. 27, 672 (1998).
M.-F.S. Tang and D.A. Stevenson, J. Phys. Chem. Solids 51, 563 (1990).
D.T. Dutton, P. Capper, E. O’Keefe, P. Mackett, M. Hastings, S. Barton and C.L. Jones, Mater. Sci. Forum 182–184, 267 (1995).
H.R. Vydyanath, J. Cryst. Growth 161, 64 (1996).
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Capper, P., Maxey, C.D., Jones, C.L. et al. Low temperature thermal annealing effects in bulk and epitaxial CdxHg1−xTe. J. Electron. Mater. 28, 637–648 (1999). https://doi.org/10.1007/s11664-999-0047-5
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DOI: https://doi.org/10.1007/s11664-999-0047-5