Abstract
The existence of Zn-As and vacancy-contained Ga-Se interfacial layers are suggested by transmission electron microscopy of Zn-and Se-exposed (or - reacted) ZnSe/GaAs interfaces, respectively. A very low density of faulted defects in the range of ∼104cm2 was obtained in samples with Zn passivation on an Asstabilized GaAs-(2 × 4). However, the density of As precipitates increases as the surface coverage of c(4 × 4) reconstruction increased on the Zn-exposed Asstabilized GaAs-(2 × 4) surface and this is associated with an increase of the density of extrinsic-type stacking faults bound by partial edge dislocations with a core structure terminated on additional cations. On the other hand, densities of extrinsic Shockley-and intrinsic Frank-type stacking faults are of ∼5 × 107/cm2 in samples grown on Se-exposed Ga-rich GaAs-(4 × 6) surfaces. Annealing on this Se-exposed Ga-rich GaAs-(4 × 6) generated a high density of vacancy loops (1 × 109/cm2) and an increase of the densities of both Shockley-and Frank-type stacking faults (>5 × 108/cm2) after the growth of the films. Furthermore, we have studied the dependence of the generation and structure of Shockley-type stacking faults on the beam flux ratios in samples grown on Zn-exposed As-stabilized GaAs-(2 × 4) surfaces. Cation-and anion-terminated extrinsic-type partial edge dislocations were generated in samples grown under Zn-and Se-rich conditions, respectively. However, an asymmetric distribution on defect density under varied beam flux ratios (0.3 ≤ PSe/PZn ≤ 10) is obtained.
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Kuo, L.H., Kimura, K., Miwa, S. et al. Role of interface chemistry and growing surface stoichiometry on the generation of stacking faults in ZnSe/GaAs. J. Electron. Mater. 26, 53–63 (1997). https://doi.org/10.1007/s11664-997-0088-6
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DOI: https://doi.org/10.1007/s11664-997-0088-6