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Modification of the Electrical Properties of a Bi0.8Ca0.2FeO3/LaNiO3/LaAlO3 Heterostructure: Effect of 80 MeV O+7 Ion Irradiation

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Abstract

Ca-doped BiFeO3/LaNiO3/LaAlO3 (BCFO/LNO/LAO) heterostructures have garnered significant interest due to their unique combination of ferroelectric, magnetic, and resistive switching properties due to interfaces and lattice mismatch/strain, leading to unique electronic properties. The roles of structural defects and oxygen vacancies are important in achieving the magnetic and electrical properties of BiFeO3-based heterostructures. By generating defects, swift heavy ion irradiation can lead to changes in the structural, optical, electrical, and magnetic properties of the materials. The Ca-doped BiFeO3 and LaNiO3 heterostructure was grown upon LAO substrates using the pulsed laser deposition technique, ensuring high-quality interfaces and controlled thicknesses. The heterostructures were irradiated with 80 MeV O+7 ions at various ion fluence levels (5 × 1010 ions/cm2 to 5 × 1012 ions/cm2). The structure and crystalline orientation of the thin films were confirmed through x-ray diffraction, while the surface morphology was measured using atomic force microscopy. Irradiation-induced modifications of the structural strain and surface morphology were investigated in the context of internal annealing effect and defect formation. The resistive switching (RS) properties of the proposed devices were assessed by I–V measurement with sweeping 0 → 5 V → 0 →  − 5 V → 0, which shows that irradiation-induced defects play an important role in the electrical properties of the proposed heterostructure. Bipolar RS behavior was also verified with the conduction mechanism, indicating that the ohmic and space-charge-limited conduction mechanism plays an important role in irradiated BCFO/LNO/LAO heterostructures.

Graphical Abstract

Graphical representation of the defect formation and RS behavior due to varying ion fluence as a function of RMS roughness and strain.

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Acknowledgments

The authors are thankful to Dr. Mukul Gupta, UGC-DAE, CSR, Indore, for XRD measurement and Dr. D. S. Rana, IISER, Bhopal, for the PLD facility. The authors also acknowledge Dr. C. Balasubramanian, FCIPT, IPR, Gandhinagar, for providing the AFM facility. ABR is thankful to IUAC New Delhi for UFR-65319 and UFR-72317, and UGC-DAE, CSR, Indore, for CSR-IC-ISUM-64/CRS-347/2020-21/949 and project funding. S.H. acknowledges the DST-INSPIRE for Fellowship (DST/INSPIRE/03/2023/000106). J. S. acknowledges the DST-INSPIRE for Fellowship (DST/INSPIRE/03/2018/000699).

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Authors and Affiliations

  1. Department of Nanoscience and Advanced Materials, Saurashtra University, Rajkot, 360005, India

    Sumana Hajra, P. Josely Jose, Urjitsinh I. Rathod & Ashish Ravalia

  2. Department of Physics, Marwadi University, Rajkot, 360003, India

    P. Josely Jose & Mukesh Keshvani

  3. The Patidar Gin Science College, Bardoli, 394601, India

    Mukesh Keshvani

  4. Department of Physics, Indian Institute of Science Education and Research, Bhopal, 462066, India

    Jayaprakash Sahoo & Megha Vagadia

  5. Department of Physics, Saurashtra University, Rajkot, 360005, India

    Megha Vagadia

  6. Inter-University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi, 110067, India

    R. Meena & S. Ojha

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  1. Sumana Hajra
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Hajra, S., Josely Jose, P., Rathod, U.I. et al. Modification of the Electrical Properties of a Bi0.8Ca0.2FeO3/LaNiO3/LaAlO3 Heterostructure: Effect of 80 MeV O+7 Ion Irradiation. J. Electron. Mater. (2024). https://doi.org/10.1007/s11664-024-11139-0

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