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Effect of Surface Roughness on the Magnetism, Nano-indentation, Surface Energy, and Electrical Properties of Co60Fe20Dy20 Films on Si (100) Substrate

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Abstract

In this study, we focused on depositing a target material, cobalt-iron-dysprosium (Co60Fe20Dy20), onto silicon (Si) (100) substrates with thickness varying from 10 nm to 50 nm through a direct-current (DC) magnetron sputtering technique. The subsequent step involved subjecting the samples to an hour-long annealing process in a vacuum annealing furnace at temperatures of 100°C, 200°C, and 300°C. To assess the elemental composition of the CoFeDy films, energy-dispersive X-ray spectroscopy (EDS) was employed. An observed trend indicated an increase in low-frequency alternating-current magnetic susceptibility (χac) with the increasing thickness. Remarkably, the CoFeDy films exhibited their peak χac following annealing at 300°C, with an optimal resonance frequency of 50 Hz. After annealing at 300°C, the CoFeDy film’s surface energy peaked at 50 nm. The magnetic, electrical, and adhesive properties of the CoFeDy films were notably influenced by surface roughness at different annealing temperatures. Atomic force microscopy (AFM) analysis revealed a gradual reduction in film roughness post-annealing, corresponding to smoother surfaces indicative of a weaker domain wall pinning effect, heightened carrier conductivity, and increased liquid spreading. Collectively, these outcomes contributed to diminished χac, reduced electrical resistance, and enhanced adhesion.

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Acknowledgments

This work was assisted by the National Yunlin University of Science and Technology (113T01).

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Authors and Affiliations

  1. Department of Materials Science and Engineering, I-Shou University, Kaohsiung, 840, Taiwan, ROC

    Wen-Jen Liu

  2. Bachelor Program in Industrial Technology, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou, 64002, Yunlin, Taiwan, ROC

    Yung-Huang Chang

  3. Department of Mechanical Engineering, National Kaohsiung University of Science and Technology, Kaohsiung City, 80778, Taiwan, ROC

    Chia-Chin Chiang

  4. Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou, 64002, Yunlin, Taiwan, ROC

    Yuan-Tsung Chen, Chih-Chien Lin & Pei-Ling Chen

  5. Department of Electronic Engineering, National Yunlin University of Science and Technology, 123 University Road, Section 3, Douliou, 64002, Yunlin, Taiwan, ROC

    Shih-Hung Lin

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Contributions

Conceptualization, W-JL, Y-HC,Y-TC and S-HL; methodology, Y-TC, Y-HC, C-CL and P-LC; validation, formal analysis, Y-TC, C-CL and P-LC; investigation, Y-TC and W-JL; resources, C-CC; writing—original draft preparation, Y-TC; writing—review and editing, Y-TC and W-JL; supervision, Y-TC and Y-HC; project administration, Y-TC and S-HL; funding acquisition, Y-HC and C-CC All authors have read and agreed to the published version of the manuscript.

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Correspondence to Yuan-Tsung Chen.

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Liu, WJ., Chang, YH., Chiang, CC. et al. Effect of Surface Roughness on the Magnetism, Nano-indentation, Surface Energy, and Electrical Properties of Co60Fe20Dy20 Films on Si (100) Substrate. J. Electron. Mater. 53, 1752–1762 (2024). https://doi.org/10.1007/s11664-023-10904-x

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