Abstract
In this paper, multi-channel nanowire (NW) performance is significantly improved by symmetric and asymmetric spacer length optimization. Device performance metrics including ON current (ION), OFF current (IOFF), and switching ratio (ION/IOFF) are improved by careful optimization of spacer length. It is observed that the NW FET exhibits the best performance with symmetric spacer lengths of source-side spacer length (LS) and drain-side spacer length (LD) of 15 nm, whereas it is observed to be LS = 15 nm and LD = 25 nm for asymmetric spacer lengths. The device exhibits the highest ION with the symmetric spacer, ensuring high-performance applications, and the lowest IOFF with the asymmetric spacer, ensuring low-power applications. In addition, an analog/RF performance comparison is made with symmetric and asymmetric spacers, and the circuit performance results are extracted using the Cadence tool through the Verilog-A interface by utilizing a lookup table approach. The common source (CS) amplifier and resistive load inverter are investigated and gain is determined. The CS amplifier exhibits higher gain (VOUT/VIN) with the asymmetric spacer. Further, a resistive load inverter is designed and demonstrated to realize optimal performance by varying the resistive load (RL) and operating voltage (VDD). The symmetric spacer exhibits better voltage transfer characteristics with RL variations.
Similar content being viewed by others
Data Availability
Not applicable.
References
J. Shalf, The future of computing beyond Moore’s Law. Phil. Trans. R. Soc. A. (2020). https://doi.org/10.1098/rsta.2019.0061.
R.K. Jaisawal, S. Rathore, N. Gandhi, P.N. Kondekar, S. Banchhor, V.B. Sreenivas, Y.S. Song, and N. Bagga, Self-heating and interface traps assisted early aging revelation and reliability analysis of negative capacitance FinFET, in 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM) (Seoul, 2023), pp. 1–3. https://doi.org/10.1109/EDTM55494.2023.10103127.
A. Sai Kumar, M. Deekshana, V. Bharath Sreenivasulu, R. Prasad Somineni, and D. Kanthi Sudha, Characterization for sub-5nm technology nodes of junctionless gate-all-around nanowire FETs, in 13th International Conference on Computing Communication and Networking Technologies (ICCCNT), Kharagpur, India (2022), pp. 1–5. https://doi.org/10.1109/ICCCNT54827.2022.9984269.
S.S. Katta, T. Kumari, S. Das, and P.K. Tiwari, Design and performance assessment of a vertical feedback FET. Microelectron. J. (2023). https://doi.org/10.1016/j.mejo.2023.105806.
S. Natarajan, M. Agostinelli, S. Akbar, M. Bost, A. Bowonder, V. Chikarmane, S. Chouksey, A. Dasgupta, K. Fischer, Q. Fu, T. Ghani, M. Giles, S. Govindaraju, R. Grover, W. Han, D. Hanken, E. Haralson, M. Haran, M. Heckscher, R. Heussner, P. Jain, R. James, R. Jhaveri, I. Jin, H. Kam, E. Karl, C. Kenyon, M. Liu, Y. Luo, R. Mehandru, S. Morarka, L. Neiberg, P. Packan, A. Paliwal, C. Parker, P. Patel, R. Patel, C. Pelto, L. Pipes, P. Plekhanov, M. Prince, S. Rajamani, J. Sandford, B. Sell, S. Sivakumar, P. Smith, B. Song, K. Tone, T. Troeger, J. Wiedemer, M. Yang, and K. Zhang, A 14 nm logic technology featuring 2nd-generation FinFET”, air-gapped interconnects, self-aligned double patterning and a 0.0588 µm2 SRAM cell size, in IEEE International Electron Devices Meeting (2014), pp. 3.7.1–3.7.3. https://doi.org/10.1109/IEDM.2014.7046976.
C. Auth, A. Aliyarukunju, M. Asoro, D. Bergstrom, V. Bhagwat, J. Birdsall, N. Bisnik, M. Buehler, V. Chikarmane, G. Ding, Q. Fu, H. Gomez, W. Han, D. Hanken, M. Haran, M. Hattendorf, R. Heussner, H. Hiramatsu, B. Ho, S. Jaloviar, I. Jin, S. Joshi, S. Kirby, S. Kosaraju, H. Kothari, G. Leatherman, K. Lee, J. Leib, A. Madhavan, K. Marla, H. Meyer, T. Mule, C. Parker, S. Parthasarathy, C. Pelto, L. Pipes, I. Post, M. Prince, A. Rahman, S. Rajamani, A. Saha, J. D. Santos, M. Sharma, V. Sharma, J. Shin, P. Sinha, P. Smith, M. Sprinkle, A. St. Amour, C. Staus, R. Suri, D. Towner, A. Tripathi, A. Tura, C. Ward, and A. Yeoh, A 10 nm high performance and low-power CMOS technology featuring 3rd generation FinFET transistors, Self-Aligned Quad Patterning, contact over active gate and cobalt local interconnects, in IEEE International Electron Devices Meeting (San Francisco, 2017), pp. 29.1.1–29.1.4. https://doi.org/10.1109/IEDM.2017.8268472.
S. Barraud, V. Lapras, B. Previtali, M.P. Samson, J. Lacord, S. Martinie, M.-A. Jaud, S. Athanasiou, F. Triozon, O. Rozeau, J.M. Hartmann, C. Vizioz, C. Comboroure, F. Andrieu, J.C. Barbé, M. Vinet, and T. Ernst, Performance and design considerations for gate-all-around stacked-NanoWires FETs, in IEEE International Electron Devices Meeting San Francisco, CA, USA (2017), pp. 29.2.1–29.2.4. https://doi.org/10.1109/IEDM.2017.8268473.
J.-P. Colinge, C.-W. Lee, A. Afzalian, N.D. Akhavan, R. Yan, I. Ferain, P. Razavi, B. O’Neill, A. Blake, M. White, A.-M. Kelleher, B. McCarthy, and R. Murphy, Nanowire transistors without junctions. Nat. Nanotechnol. 5, 225 (2010). https://doi.org/10.1038/nnano.2010.15.
C.-W. Lee, I. Ferain, A. Afzalian, R. Yan, N.D. Akhavan, P. Razavi, and J.-P. Colinge, Performance estimation of junctionless multigate transistors. Solid. State. Electron. 54, 97 (2010). https://doi.org/10.1016/j.sse.2009.12.003.
R. Angamuthu, B. ChettiaGoundarSengodan, M. Anandan, A. Varghese, and B.S. Vakkalakula, LG 55 nm T-gate InGaN/GaN channel based high electron mobility transistors for stable transconductance operation. Int. J. RF Microw. Comput. Aided Eng. 32, e23308 (2022). https://doi.org/10.1002/mmce.23308.
N.A. Kumari, V.B. Sreenivasulu, J. Ajayan, T. Janaradhan Reddy, and P. Prithvi, Spacer engineering on nanosheet FETs towards device and circuit perspective. ECS J. Solid State Sci. Technol. 12, 053009 (2023). https://doi.org/10.1149/2162-8777/acd65e.
R.T. Doria, M.A. Pavanello, R.D. Trevisoli, M. de Souza, C.-W. Lee, I. Ferain, N.D. Akhavan, R. Yan, P. Razavi, R. Yu, A. Kranti, and J.-P. Colinge, Junctionless multiple-gate transistors for analog applications. IEEE Trans. Electron Devices 58, 2511 (2011). https://doi.org/10.1109/TED.2011.2157826.
S. Sahay and M.J. Kumar, Realizing efficient volume depletion in SOI junctionless FETs. IEEE J. Electron. Devices Soc. 4(3), 110 (2016). https://doi.org/10.1109/JEDS.2016.2532965.
V. Thirunavukkarasu, Y.-R. Jhan, Y.-B. Liu, and Y.-C. Wu, Performance of inversion, accumulation, and junctionless mode n-Type and p-Type bulk silicon FinFETs with 3-nm gate length. IEEE Electron Device Lett. 36(7), 645 (2015). https://doi.org/10.1109/LED.2015.2433303.
A. Goel, S.K. Gupta, and K. Roy, Asymmetric drain spacer extension (ADSE) FinFETs for low-power and robust SRAMs. IEEE Trans. Electron Devices 58(2), 296 (2011). https://doi.org/10.1109/TED.2010.2090421.
P.K. Pal, B.K. Kaushik, and S. Dasgupta, Asymmetric dual-spacer trigate FinFET device-circuit codesign and its variability analysis. IEEE Trans. Electron Devices 62(4), 1105 (2015). https://doi.org/10.1109/TED.2015.2400053.
J. Singh, R. Krishnan, S. Mookerjea, S. Datta, and V. Narayanan, TFET based 6T SRAM cell. U.S. Patent 20 120 106 236 A1 (2012). https://patents.google.com/patent/US20120106236A1/en.
International Roadmap for Devices and Systems (IRDS™) 2020 Edition (2020). https://irds.ieee.org/editions/2020.
V.B. Sreenivasulu and V. Narendar, Design insights of nanosheet FET and CMOS circuit applications at 5-nm technology node. IEEE Trans. Electron Devices. 69(8), 4115 (2022). https://doi.org/10.1109/TED.2022.3181575.
N. Loubet, T. Hook, P. Montanini, C.-W. Yeung, S. Kanakasabapathy, M. Guillom, T. Yamashita, J. Zhang, X. Miao, J. Wang, A. Young, R. Chao, M. Kang, Z. Liu, S. Fan, B. Hamieh, S. Sieg, Y. Mignot, W. Xu, S.-C. Seo, J. Yoo, S. Mochizuki, M. Sankarapandian, O. Kwon, A. Carr, A. Greene, Y. Park, J. Frougier, R. Galatage, R. Bao, J. Shearer, R. Conti, H. Song, D. Lee, D. Kong, Y. Xu, A. Arceo, Z. Bi, P. Xu, R. Muthinti, J. Li, R. Wong, D. Brown, P. Oldiges, R. Robison, J. Arnold, N. Felix, S. Skordas, J. Gaudiello, T. Standaert, H. Jagannathan, D. Corliss, M.-H. Na, A. Knorr, T. Wu, D. Gupta, S. Lian, R. Divakaruni, T. Gow, C. Labelle, S. Lee, V. Paruchuri, H. Bu, and M. Khare, Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET, in 2017 Symposium on VLSI Technology (2017), pp. T230–T231. https://doi.org/10.23919/VLSIT.2017.7998183.
S. Verma, P.K. Pal, S. Mahawar, and B.K. Kaushik, Performance enhancement of STT MRAM using asymmetric-k sidewall-spacer NMOS. IEEE Trans. Electron Devices. 63(7), 2771 (2016). https://doi.org/10.1109/TED.2016.2570602.
V.B. Sreenivasulu, N.A. Kumari, V. Lokesh, S.K. Vishvakarma, and V. Narendar, Common source amplifier and ring oscillator performance optimization using multi-ridge/Nanosheet FETs. ECS J. Solid State Sci. Technol. 12, 23013 (2023). https://doi.org/10.1149/2162-8777/acbb9e.
N.A. Kumari, V.B. Sreenivasulu, and P. Prithvi, Impact of scaling on nanosheet FET and CMOS circuit applications. ECS J. Solid State Sci. Technol. 12, 33001 (2023). https://doi.org/10.1149/2162-8777/acbcf2.
Cadence Virtuoso Spectre Circuit Simulator, Cadence Des. Syst., San Jose, CA, USA (2016).
Acknowledgments
The authors would like to thank the department of IIT Patna for providing the TCAD Tools.
Funding
The authors declare that they have no financial interests.
Author information
Authors and Affiliations
Contributions
VBS: writing—original draft preparation, formal analysis, investigation, simulation, device simulation; AK: data curation, circuit simulation; VL: grammar and proof editing; A: proof review and editing; MU: review and editing; VV: resistive load inverter discussions.
Corresponding author
Ethics declarations
Conflict of interest
The authors have no conflicts of interest to declare that are relevant to the content of this article.
Consent to Participate
Not applicable.
Consent for Publication
Not applicable.
Additional information
Publisher's Note
Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
About this article
Cite this article
Sreenivasulu, V.B., Kumari, N.A., Lokesh, V. et al. Design of Resistive Load Inverter and Common Source Amplifier Circuits Using Symmetric and Asymmetric Nanowire FETs. J. Electron. Mater. 52, 7268–7279 (2023). https://doi.org/10.1007/s11664-023-10618-0
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11664-023-10618-0