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Structural, Surface, and Electronic Structure Properties of Ag Ion-Implanted SrVO3 Thin Films

  • Topical Collection: Synthesis and Advanced Characterization of Magnetic Oxides
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Abstract

SrVO3 films have been deposited on quartz substrates using radiofrequency (RF) sputtering technique. Ag ions have been implanted with three fluences: 1 × 1015 ions/cm2, 3 × 1015 ions/cm2, and 5 × 1015 ions/cm2. The glancing-angle x-ray diffraction (GIXRD) results exhibited a decrease in the peak intensity; however, the results ruled out the possibility of other secondary phase formation upon increasing the Ag ion fluence. Field emission scanning electron microscopy (FESEM) results revealed that Ag implantation has sputtered the surface layer and created rough/emptied films. Significant broadening/splitting of V L2 near-edge x-ray absorption fine structure (NEXAFS) spectra convey the incorporation of Ag 4d states in the energy band structure of SrVO3 and electronic transitions from V 2p1/2 states to the Ag-related states. O K-edge spectra have ruled out the charge transfer of O 1s orbits to the Ag states, even upon increasing the Ag concentration, and nullified the formation of AgO types of secondary phases.

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Acknowledgments

Aditya Sharma is thankful to IUAC, New Delhi, India, for providing 90 keV Ag ion beam from the low-energy ion beam facility (LIEBF) under the BTR proposal scheme (number 65520). Hyun-Joon Shin would like to acknowledge the support from the National Research Foundation of Korea (NRF- 2015R1A5A1009962).

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Sharma, A., Devi, K.D., Varshney, M. et al. Structural, Surface, and Electronic Structure Properties of Ag Ion-Implanted SrVO3 Thin Films. J. Electron. Mater. 51, 1900–1904 (2022). https://doi.org/10.1007/s11664-022-09454-5

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