Effect of Concentration of Single-Wall Carbon Nanotubes (SWCNTs) in a SWCNTs/ZnO Nanorods Channel-Based Thin-Film Transistor

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Fabrication of three thin-film transistor devices by deposition of single-walled carbon nanotubes (SWCNTs) thin film over hydrothermally grown nanorods of zinc oxide (ZnO) on silicon dioxide (SiO2) layered n-type silicon is reported. In this architecture, SWCNTs/ZnO nanorods were used for the channel layer. The silicon dioxide deposited over silicon substrate was used as a dielectric. Three devices were prepared by varying the concentration of carbon nanotubes to investigate the effect on electrical properties of prepared thin-film transistors. XRD and EDX analysis was performed for the study of structural and elemental properties. Scanning electron microscopy (SEM) was used to examine the surface morphology of SWCNTs/ZnO nanorods. Transfer and output characteristics were studied using a Keithley SourceMeter. IV analysis revealed that an increase in the concentration of carbon nanotubes increased the mobility values and Ion/Ioff, but the threshold voltage was decreased.

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Correspondence to Hamid Latif.

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Latif, H., Rasheed, S., Sattar, A. et al. Effect of Concentration of Single-Wall Carbon Nanotubes (SWCNTs) in a SWCNTs/ZnO Nanorods Channel-Based Thin-Film Transistor. Journal of Elec Materi 48, 7055–7062 (2019). https://doi.org/10.1007/s11664-019-07517-8

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  • Carbon nanotubes
  • thin-film transistors
  • ZnO nanorods
  • nano-composites
  • channel layer