Abstract
Cubic silicon carbide (3C-SiC) films were grown by pulsed laser deposition (PLD) on magnesium oxide [MgO (100)] substrates at a substrate temperature of 800°C. Besides, p-type SiC was prepared by laser assisted doping of Al in the PLD grown intrinsic SiC film. The SiC phases, in the grown thin films, were confirmed by x-ray diffraction (XRD), Si–C bond structure is identified by Fourier-transform infrared spectroscopy spectrum analysis. Measurements based on the XRD and Raman scattering techniques confirmed improvement in crystallization of 3C-SiC thin films with the laser assisted doping. The studies on I–V characteristics by two probe technique, elemental analysis by energy dispersion spectrum, binding energy by x-ray photoelectron spectroscopy and carrier concentration by Hall effect, ensured Al doping in SiC thin film. From the UV–visible NIR spectroscopic analysis, the optical bandgap of the PLD grown 3C-SiC was obtained. Numerical analysis of temperature and carrier concentration distribution is simulated to understand the mechanism of laser assisted doping.
Similar content being viewed by others
References
G. Polupan and T.V. Torchynska, Thin Solid Films 518, S208 (2010).
A. Keffous, K. Bourenane, M. Kechouane, N. Gabouze, and T. Kerdja, Vacuum 81, 632 (2007).
N.V. Dyakonova, P.A. Ivanov, V.A. Kozlov, M.E. Levinshtein, J.W. Palmour, S.L. Rumyantsev, and R. Singh, IEEE Trans. Electron Devices 46, 2188 (1999).
J.B. Casady and R.W. Johnson, Solid State Electron. 39, 1409 (1996).
R. Yakimova, R.M. Petoral, G.R. Yazdi, C. Vahlberg, A. Lloyd Spetz, and K. Uvdal, J. Phys. D. Appl. Phys. 40, 6435 (2007).
P. Tanner, A. Iacopi, H.P. Phan, S. Dimitrijev, L. Hold, K. Chaik, G. Walker, D.V. Dao, and N.T. Nguyen, Sci. Rep. 7, 17734 (2017).
A.B.M.A. Ashrafi, Y. Segawa, K. Shin, J. Yoo, and T. Yao, Appl. Surf. Sci. 249, 139 (2005).
H. Yano, T. Hirao, T. Kimoto, H. Matsunami, K. Asano, and Y. Sugawara, IEEE Electron Device Lett. 20, 611 (1999).
Y.I. Alivov, Ü. ÖzgÜr, S. Do, D. Johnstone, and P. Ruterana, Superlattices Microstruct. 38, 439 (2005).
M. Syväjärvi, Q. Ma, V. Jokubavicius, A. Galeckas, J. Sun, X. Liu, M. Jansson, P. Wellmann, M. Linnarsson, P. Runde, B. Andre, A. Thøgersen, S. Diplas, P. Almeida, O. Martin, D. Nilsen, A. Yu, and B.G. Svensson, Sol. Energy Mater. Sol. Cells 145, 104 (2016).
H. Phan, P. Tanner, D.V. Dao, L. Wang, N. Nguyen, Y. Zhu, and S. Dimitrijev, IEEE Electron Device Lett. 35, 399 (2014).
S. Roy, C. Jacob, and S. Basu, Sens. Actuators B Chem. 94, 298 (2003).
J. Zhu, B. Lin, X. Sun, R. Yao, C. Shi, and Z. Fu, Thin Solid Films 478, 218 (2005).
Z. Tian, I.A. Salama, N.R. Quick, and A. Kar, Acta Mater. 53, 2835 (2005).
H. Matsunami, Jpn. J. Appl. Phys. 43, 6835 (2004).
M. Hernandez, J. Venturini, D. Zahorski, J. Boulmer, D. Débarre, G. Kerrien, T. Sarnet, C. Laviron, M.N. Semeria, D. Camel, and J.L. Santailler, Appl. Surf. Sci. 208, 345 (2003).
D. Cammilleri, F. Fossard, D. Débarre, C. Tran Manh, C. Dubois, E. Bustarret, C. Marcenat, P. Achatz, D. Bouchier, and J. Boulmer, Thin Solid Films 517, 75 (2008).
A. Ikeda, R. Sumina, H. Ikenoue, and T. Asano, Jpn. J. Appl. Phys. 55, 1 (2016).
K.S. Kim and G.S. Chung, Sens. Actuators A Phys. 155, 125 (2009).
J. Pezoldt, B. Stottko, G. Kupris, and G. Ecke, Mater. Sci. Eng. B 29, 94 (1995).
M. Vendan, P. Molian, A. Bastawros, and J. Anderegg, Mater. Sci. Semicond. Process. 8, 630 (2005).
S.M. Pelt, J.S. Ramsey, and M.E. Durbin, Thin Solid Films 371, 72 (2000).
Y.S. Katharria, S. Kumar, R.J. Choudhary, R. Prakash, F. Singh, N.P. Lalla, D.M. Phase, and D. Kanjilal, Thin Solid Films 516, 6083 (2008).
M. Tabbal, A. Said, E. Hannoun, and T. Christidis, Appl. Surf. Sci. 253, 7050 (2007).
R. Mahapatra, A.K. Chakraborty, A.B. Horsfall, S. Chattopadhyay, N.G. Wright, K.S. Coleman, and K.S. Coleman, J. Appl. Phys. 102, 024105 (2007).
L.M. Lin and P.T. Lai, J. Appl. Phys. 102, 054515 (2007).
R. Mahapatra, A.K. Chakraborty, N. Poolamai, A. Horsfall, S. Chattopadhyay, N.G. Wright, K.S. Coleman, P.G. Coleman, C.P. Burrows, and K.S. Coleman, J. Vac. Sci. Technol. B 25, 217 (2007).
A. Posadas, F.J. Walker, C.H. Ahn, T.L. Goodrich, Z. Cai, and K.S. Ziemer, Appl. Phys. Lett. 92, 233511 (2008).
P. Prene, P. Belleville, B. Minot, and R. Je, Mater. Sci. Semicond. Process. 7, 249 (2004).
P. Pren and J. Robert, J. Eur. Ceram. Soc. 25, 2795 (2005).
S. Kaneko, T. Nagano, K. Akiyama, T. Ito, M. Yasui, Y. Hirabayashi, H. Funakubo, and M. Yoshimoto, J. Appl. Phys. 107, 073523 (2010).
S.Y. Lee, S.H. Lee, E.J. Nah, S.S. Lee, and Y. Kim, J. Cryst. Growth 236, 635 (2002).
E. Paneerselvam, N.J. Vasa, and M.S.R. Rao, J. Laser Micro Nanoeng. 11, 71 (2016).
V. Bhimasingu, E. Pannirselvam, N.J. Vasa, and I.A. Palani, Int. J. Adv. Manuf. Technol. 84, 769 (2016).
F. Neri, F. Barreca, and S. Trusso, Diam. Relat. Mater. 11, 273 (2002).
R.S. Okojie, M. Xhang, P. Pirouz, S. Tumakha, G. Jessen, and L.J. Brillson, Appl. Phys. Lett. 79, 3056 (2001).
L.J. Brillson, S. Tumakha, G.H. Jessen, R.S. Okojie, M. Zhang, P. Pirouz, L.J. Brillson, S. Tumakha, and G.H. Jessen, Appl. Phys. Lett. 81, 2785 (2002).
R. Yakimova, R. Vasiliauskas, J. Eriksson, and M. Syväjärvi, Mater. Sci. Forum 711, 3 (2012).
S.Z. El Abedin, E.M. Moustafa, R. Hempelmann, H. Natter, and F. Endres, Electrochem. Commun. 7, 1111 (2005).
Z. Tian, N.R. Quick, and A. Kar, Acta Mater. 54, 4273 (2006).
S. Bet, N. Quick, and A. Kar, Acta Mater. 55, 6816 (2007).
L.L. Snead, J. Nucl. Mater. 329, 524 (2004).
D. Marui, A. Ikeda, K. Nishi, H. Ikenoue, and T. Asano, Jpn. J. Appl. Phys. 53, 4 (2014).
Y.E.B. Vidhya and N.J. Vasa, Mater. Res. Express 5, 066410 (2018).
L. Rimai, R. Ager, E.M. Logothetis, W.H. Weber, and J. Hangas, Appl. Phys. Lett. 59, 2266 (1991).
S. Nakashima and H. Harima, Phys. Status Solidi Appl. Res. 162, 39 (1997).
P.M. Lundquist, H.C. Ong, W.P. Lin, R.P.H. Chang, J.B. Ketterson, and G.K. Wong, Appl. Phys. Lett. 67, 2919 (1995).
Y.S. Katharria, S. Kumar, R. Prakash, R.J. Choudhary, F. Singh, D.M. Phase, and D. Kanjilal, J. Non. Cryst. Solids 353, 4660 (2007).
A.A. Lebedev, Semicond. Sci. Technol. 21, 17 (2006).
M. Schlaf, D. Sands, and P.H. Key, Appl. Surf. Sci. 154, 83 (2000).
A.V. Semenov, A.V. Lopin, V.M. Puzikov, O.M. Vovk, I.N. Dmitruk, and V. Romano, Thin Solid Films 520, 6626 (2012).
A. Tabata and M. Mori, Thin Solid Films 516, 626 (2008).
C. Persson, U. Lindefelt, and B.E. Sernelius, J. Appl. Phys. 86, 4419 (1999).
R. Weingärtner, P.J. Wellmann, M. Bickermann, D. Hofmann, T.L. Straubinger, and A. Winnacker, Appl. Phys. Lett. 80, 70 (2002).
G. Leggieri, A. Luches, M. Martino, A. Perrone, R. Alexandrescu, A. Barborica, E. Gyorgy, I.N. Mihailescu, G. Majni, and P. Mengucci, Appl. Surf. Sci. 96, 866 (1996).
Y.X. Wang, J. Wen, Z. Guo, Y.Q. Tang, H.G. Tang, and J.X. Wu, Thin Solid Films 338, 93 (1999).
R.J. Iwanowski, K. Fronc, W. Paszkowicz, and M. Heinonen, J. Alloys Compd. 286, 143 (1999).
S. Trusso, F. Barreca, and F. Neri, J. Appl. Phys. 92, 2485 (2002).
J.P. Huang, L.W. Wang, J. Wen, Y.X. Wang, C.L. Lin, and M. Ostling, Diam. Relat. Mater. 8, 2099 (1999).
J.G. Kim, E.J. Jung, Y. Kim, Y. Makarov, and D.J. Choi, Ceram. Int. 40, 3953 (2014).
S. Oswald and H. Wirth, Surf. Interface Anal. 27, 136 (1999).
T. Muranaka, Y. Kikuchi, T. Yoshizawa, N. Shirakawa, and J. Akimitsu, Sci. Technol. Adv. Mater. 9, 044204 (2009).
R. Vasiliauskas, A. Mekys, P. Malinovskis, S. Juillaguet, M. Syväjärvi, J. Storasta, and R. Yakimova, J. Phys. D Appl. Phys. 45, 225102 (2012).
Acknowledgments
The authors are grateful to Mr. Xavier (Universal Carborundum Limited) for providing SiC powder. Dr. R. Jayaganthan, IIT Roorkee is thanked for providing help in preparation of SPS SiC targets. Authors also gratefully acknowledge the thin film characterisation facility provided by Dr. I. A. Palani at IIT Indore and Dr. A. Subrahmanyam at IIT Madras. Authors are thankful to Hamdan Mohammed Ridwan for his help in the theoretical analysis. Part of this work is supported by DSTJSPS Project (DST/INT/JSPS/P-244/2017). The authors like to acknowledge the help received for material characterization at the Nano Functional Materials Technology Center in IIT Madras established by the Department of Science and Technology (DST) of India [Grant No. SR/NM/NAT-02/2005].
Author information
Authors and Affiliations
Corresponding author
Additional information
Publisher's Note
Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
About this article
Cite this article
Paneerselvam, E., Lakshmi Narayanan, V.K., Vasa, N.J. et al. Laser Assisted Doping of Silicon Carbide Thin Films Grown by Pulsed Laser Deposition. J. Electron. Mater. 48, 3468–3478 (2019). https://doi.org/10.1007/s11664-019-07097-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11664-019-07097-7