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Structural, Optical, and Vibrational Properties of ZnO Microrods Deposited on Silicon Substrate

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Abstract

Zinc oxide (ZnO) microrod films deposited by spray pyrolysis on silicon substrate at 350 ± 5°C have been studied and evaluated, and compared with thin films deposited by electron beam to confirm the identity of the studied samples. The films were characterized using different techniques. The microrod structure was studied and confirmed by scanning electron microscopy. Fourier-transform infrared (FTIR) spectroscopy and x-ray diffraction analysis confirmed successful deposition of ZnO thin films with the expected wurtzite structure. Reflectance data showed a substantial drop across the whole studied wavelength range. The photoluminescence (PL) spectra of the studied samples showed a peak at ∼ 360 nm, representing a signature of ZnO. The shift in the PL peak position is due to defects and other species present in the films, as confirmed by FTIR and energy-dispersive x-ray spectroscopy results.

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Authors and Affiliations

  1. School of Science, Department of Physics, University of Jordan, Amman, 11942, Jordan

    Bashar I. Lahlouh & Hassan K. Juwhari

  2. Faculty of Science, Physics Department, Al Isra University, Amman, 11622, Jordan

    Shadia J. Ikhmayies

Authors
  1. Bashar I. Lahlouh
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  2. Shadia J. Ikhmayies
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  3. Hassan K. Juwhari
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Correspondence to Bashar I. Lahlouh.

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Lahlouh, B.I., Ikhmayies, S.J. & Juwhari, H.K. Structural, Optical, and Vibrational Properties of ZnO Microrods Deposited on Silicon Substrate. J. Electron. Mater. 47, 4455–4462 (2018). https://doi.org/10.1007/s11664-018-6178-9

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  • DOI: https://doi.org/10.1007/s11664-018-6178-9

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