Carbon-Incorporated Amorphous Indium Zinc Oxide Thin-Film Transistors

Journal of Electronic Materials volume 43, pages4224–4228(2014)Cite this article

Abstract

We propose the use of amorphous-carbon indium zinc oxide (a-CIZO) as a channel material for thin-film transistor (TFT) fabrication. This study chose a carbon dopant as a carrier suppressor and strong oxygen binder in amorphous-indium zinc oxide (a-IZO) channel material. a-CIZO thin films were deposited using radiofrequency (RF) sputtering and postannealed at 150°C. X-ray diffraction and transmission electron microscopy analysis revealed that the film remained amorphous even after postannealing. The a-CIZO TFT postannealed at 150°C exhibited saturation field-effect mobility of 16.5 cm2 V−1 s−1 and on–off current ratio of ∼4.3 × 107.

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References

  1. 1.

    T. Kamiya and H. Hosono, NPG Asia Mater. 2, 15 (2010).

    Article  Google Scholar 

  2. 2.

    R. Hayashi, A. Sato, M. Ofuji, K. Abe, H. Yabuta, M. Sano, H. Kumomi, K. Nomura, T. Kamiya, and M. Hirano, SID Symp. Digest. 39, 621 (2008).

    Article  Google Scholar 

  3. 3.

    T. Arai, J. Soc. Inf. Disp. 20, 156 (2012).

    Article  Google Scholar 

  4. 4.

    J.S. Park, K. Kim, Y.G. Park, Y.G. Mo, H.D. Kim, and J.K. Jeong, Adv. Mater. 21, 329 (2009).

    Article  Google Scholar 

  5. 5.

    J.-Y. Kwon, J.S. Jung, K.S. Son, K.-H. Lee, J.S. Park, T.S. Kim, J.-S. Park, R. Choi, J.K. Jeong, B. Koo, and S.Y. Lee, Appl. Phys. Lett. 97 (2010).

  6. 6.

    H. Yong Chong, K. Wan Han, Y. Soo No, and T. Whan Kim, Appl. Phys. Lett. 99, 161908 (2011).

  7. 7.

    E. Chong, Y.S. Chun, and S.Y. Lee, Appl. Phys. Lett. 97, 102102 (2010).

    Article  Google Scholar 

  8. 8.

    P. Jae-Chul, K. Sang-Wook, K. Chang-Jung, and L. Ho-Nyeon, IEEE Electron Device Lett. 33, 685 (2012).

    Article  Google Scholar 

  9. 9.

    J.C. Park, S.W. Kim, C.J. Kim, and H.-N. Lee, IEEE Electron Device Lett. 33, 809 (2012).

    Article  Google Scholar 

  10. 10.

    K. Ebata, S. Tomai, Y. Tsuruma, T. Iitsuka, S. Matsuzaki, and K. Yano, Appl. Phys. Express 5, 1102 (2012).

    Article  Google Scholar 

  11. 11.

    S. Aikawa, P. Darmawan, K. Yanagisawa, T. Nabatame, Y. Abe, and K. Tsukagoshi, Appl. Phys. Lett. 102, 102101 (2013).

    Article  Google Scholar 

  12. 12.

    S. Aikawa, T. Nabatame, and K. Tsukagoshi, Appl. Phys. Lett. 103, 172105 (2013).

    Article  Google Scholar 

  13. 13.

    L. Lan, N. Xiong, P. Xiao, M. Li, H. Xu, R. Yao, S. Wen, and J. Peng, Appl. Phys. Lett. 102, 242102 (2013).

    Article  Google Scholar 

  14. 14.

    H. Kumomi, S. Yaginuma, H. Omura, A. Goyal, A. Sato, M. Watanabe, M. Shimada, N. Kaji, K. Takahashi, and M. Ofuji, J. Display Technol. 5, 531 (2009).

    Article  Google Scholar 

  15. 15.

    J.W. Hennek, J. Smith, A. Yan, M.-G. Kim, W. Zhao, V.P. Dravid, A. Facchetti, and T.J. Marks, J. Am. Chem. Soc. 135, 10729 (2013).

    Article  Google Scholar 

  16. 16.

    H.S. Shin, G.H. Kim, W.H. Jeong, B. Du Ahn, and H.J. Kim, Jpn. J. Appl. Phys. 49, 03CB01 (2010).

  17. 17.

    J. Kerr, CRC Handbook of Chemistry and Physics, 81st ed. (Boca Raton, FL: CRC Press, 2000).

    Google Scholar 

  18. 18.

    Y. Zhang, Inorg. Chem. 21, 3886 (1982).

    Article  Google Scholar 

  19. 19.

    G. Campet, S.D. Han, S.J. Wen, J.P. Manaud, J. Portier, Y. Xu, and J. Salardenne, Mater. Sci. Eng. B. 19, 285 (1993).

    Article  Google Scholar 

  20. 20.

    S. Calnan and A. Tiwari, Thin Solid Films 518, 1839 (2010).

    Article  Google Scholar 

  21. 21.

    S. Jeong, Y.G. Ha, J. Moon, A. Facchetti, and T.J. Marks, Adv. Mater. 22, 1346 (2010).

    Article  Google Scholar 

  22. 22.

    K. Banger, Y. Yamashita, K. Mori, R. Peterson, T. Leedham, J. Rickard, and H. Sirringhaus, Nat. Mater. 10, 45 (2010).

    Article  Google Scholar 

  23. 23.

    L. Lan and J. Peng, IEEE Trans. Electron Devices 58, 1452 (2011).

    Article  Google Scholar 

  24. 24.

    M.-S. Wong, S.-H. Wang, T.-K. Chen, C.-W. Weng, and K.K. Rao, Surf. Coat. Technol. 202, 890 (2007).

    Article  Google Scholar 

  25. 25.

    V. Kiran and S. Sampath, ACS Appl. Mater. Interfaces 4, 3818 (2012).

    Article  Google Scholar 

  26. 26.

    K. Chu, J.P. Chang, M.L. Steigerwald, R.M. Fleming, R.L. Opila, D.V. Lang, R.B. Van Dover, and C.D.W. Jones, J.␣Appl. Phys. 91, 308 (2002).

    Article  Google Scholar 

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Acknowledgements

This research was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT, and Future Planning (NRF-2013 R1A1A1061213).

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Affiliations

  1. School of Integrated Technology and Yonsei Institute of Convergence Technology, Yonsei University, Yeonsu-gu, Incheon, 406-840, Korea

    S. Parthiban, K. Park, H.-J. Kim, S. Yang & J.-Y. Kwon

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  1. S. Parthiban
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  2. K. Park
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  3. H.-J. Kim
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  4. S. Yang
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  5. J.-Y. Kwon
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Correspondence to J.-Y. Kwon.

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Parthiban, S., Park, K., Kim, HJ. et al. Carbon-Incorporated Amorphous Indium Zinc Oxide Thin-Film Transistors. Journal of Elec Materi 43, 4224–4228 (2014). https://doi.org/10.1007/s11664-014-3333-9

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Keywords

  • Metal oxide
  • amorphous
  • thin-film transistor
  • sputtering