Journal of Electronic Materials

, Volume 43, Issue 6, pp 2145–2150 | Cite as

Thermoelectric Properties of Al-Doped ZnO Thin Films

  • S. Saini
  • P. Mele
  • H. Honda
  • K. Matsumoto
  • K. Miyazaki
  • A. Ichinose
Article

Abstract

We have prepared 2 % Al-doped ZnO (AZO) thin films on SrTiO3 substrates by a pulsed laser deposition technique at various deposition temperatures (Tdep = 300–600 °C). The thermoelectric properties of AZO thin films were studied in a low temperature range (300–600 K). Thin film deposited at 300 °C is fully c-axis-oriented and presents electrical conductivity 310 S/cm with Seebeck coefficient −65 μV/K and power factor 0.13 × 10−3 Wm−1 K−2 at 300 K. The performance of thin films increases with temperature. For instance, the power factor is enhanced up to 0.55 × 10−3 Wm−1 K−2 at 600 K, surpassing the best AZO film previously reported in the literature.

Key words

Thermoelectric ZnO thin films PLD Seebeck power factor 

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Copyright information

© TMS 2014

Authors and Affiliations

  • S. Saini
    • 1
  • P. Mele
    • 1
  • H. Honda
    • 2
  • K. Matsumoto
    • 3
  • K. Miyazaki
    • 4
  • A. Ichinose
    • 5
  1. 1.Institute for Sustainable Sciences and DevelopmentHiroshima UniversityHigashi-HiroshimaJapan
  2. 2.Graduate School for Advanced Sciences of MatterHiroshima UniversityHigashi-HiroshimaJapan
  3. 3.Department of Material ScienceKyushu Institute of TechnologyKitakyushuJapan
  4. 4.Department of Mechanical EngineeringKyushu Institute of TechnologyKitakyushuJapan
  5. 5.Electric Power Engineering Research LaboratoryCRIEPIYokosukaJapan

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