Abstract
In this work, we investigated the role of ultraviolet (UV) curing on the dielectric constant (k) and molecular structure of a porous organosilicate glass (p-OSG) dielectric with k of approximately 2.5. The dielectric constant was investigated in a fundamental manner by quantifying its polarizability components: electronic, ionic, and dipolar. A method involving the Kramers–Kronig relations was formulated to separate the ionic and electronic polarizabilities. After quantifying the polarizability components, the evolution of the molecular structure with UV curing was investigated by Fourier-transform infrared spectroscopy (FTIR) and x-ray photoelectron spectroscopy (XPS). The results from the molecular structure investigation were used to explain the observed trends in polarizability.
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Smith, R.S., Tsui, T. & Ho, P.S. Analysis of Ultraviolet Curing Effect on the Dielectric Constant and Molecular Structure of a Porous Dielectric Film. J. Electron. Mater. 39, 2337–2345 (2010). https://doi.org/10.1007/s11664-010-1297-y
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DOI: https://doi.org/10.1007/s11664-010-1297-y