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A Numerical Simulation of Nanostructure Formation Utilizing Electromigration

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Abstract

A numerical method to simulate nanostructure formation due to electromigration in passivated Al specimens is developed based on the governing parameter for electromigration damage, \( {\hbox{AFD}}^{\ast}_{\rm gen}. \) The nanostructure formation is influenced by conditions such as the current density and substrate temperature. The results of the simulations are verified through experiments, and good agreement between the simulations and experiments is found for changes in nanostructure volume. The simulation is expected to be useful for identifying effective conditions for nanostructure formation.

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Acknowledgement

This work was supported by a Grant-in-Aid for Scientific Research (S) 18106003.

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Authors and Affiliations

  1. Department of Intelligent Machines and System Engineering, Hirosaki University, Hirosaki, 036-8561, Japan

    Kazuhiko Sasagawa & Shota Fukushi

  2. Department of Nanomechanics, Tohoku University, Sendai, 980-8579, Japan

    Yuxin Sun & Masumi Saka

Authors
  1. Kazuhiko Sasagawa
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  2. Shota Fukushi
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  3. Yuxin Sun
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  4. Masumi Saka
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Correspondence to Kazuhiko Sasagawa.

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Sasagawa, K., Fukushi, S., Sun, Y. et al. A Numerical Simulation of Nanostructure Formation Utilizing Electromigration. J. Electron. Mater. 38, 2201–2206 (2009). https://doi.org/10.1007/s11664-009-0853-9

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  • DOI: https://doi.org/10.1007/s11664-009-0853-9

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