Optical admittance spectroscopy (OAS), supported by electron paramagnetic resonance (EPR) measurements, is used to identify the controversial vanadium acceptor levels in vanadium-doped semi-insulating (SI) 4H-SiC and 6H-SiC. The V3+/4+ levels for the cubic site are likely located at E c − 0.67 ± 0.02 eV and E c − 0.70 ± 0.02 eV in 6H-SiC and E c − 0.75 ± 0.02 eV in 4H-SiC. A peak at 0.87 ± 0.02 eV in the 6H-SiC is tentatively assigned to the same transition at the hexagonal site and the associated transition in 4H-SiC is thought to occur near 0.94 eV. All assignments are supported by the observation of V3+ in the EPR spectrum.
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Acknowledgments
This work is supported by the National Science Foundation and by Dr. Colin Wood, Office of Naval Research. Dr. W. Mitchel contributed the samples and Hall measurement data, and the ITO deposition was provided by G. Landis, Wright Patterson Air Force Base, AFRL. The authors thank Mr. S. Smith and Dr. V. Konovalov for their assistance with the initial OAS measurement.
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Lee, W., Zvanut, M.E. A Study of Deep Defect Levels in Semi-Insulating SiC Using Optical Admittance Spectroscopy. J. Electron. Mater. 36, 623–628 (2007). https://doi.org/10.1007/s11664-007-0100-1
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DOI: https://doi.org/10.1007/s11664-007-0100-1