Abstract
We applied high resolution x-ray diffraction techniques to determine the three dimensional domain shape in nominally lattice-matched, CuPtB ordered, InxGa1−xP epitaxial layers deposited on GaAs by metal organic vapor phase epitaxy. A technique of reciprocal space mapping is described which provides three-dimensional information on the shape and size of the ordered domains. The domain shape is obtained by reciprocal space mapping along orthogonal crystallographic directions. Applying this technique shows that, at large miscut angles, the domains are oriented close to the growth direction, and are elongated by differing extents along the [110] and [\(\bar 110\)].
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References
A. Zunger and S. Mahajan, Handbook on Semiconductors (Amsterdam: Elsevier Science B.V., 1994).
M. Suzuki, Y. Nishikawa, M. Ishikawa, I. Hino, and T. Yuasa, J. Cryst. Growth 113, 127 (1991).
K.A. Mader and A. Zunger, Appl. Phys. Lett. 64, 2882 (1994).
R.L. Forrest, T.D. Golding, S.C. Moss, Z. Zhang, J.F. Geisz, J.M. Olson, A. Mascarenhas, P. Ernst, and C. Geng, Phys. Rev. B 58, 15355 (1998).
M.K. Lee, R.H. Horng, and L.C. Haung, J. Cryst. Growth 124, 358 (1992).
L.C. Su, I.H. Ho, and G.B. Stringfellow, Appl. Phys. Lett. 65, 749 (1994).
S.R. Lee (Paper presented at Workshop W-10, Heteroepitaxial Layers and Semiconductor Substrates I, 46th Annual Denver X-Ray Conference, Steamboat Springs, CO, 1997).
L. Francesio, L. Alagna, B. Capelle, C. Ferrari, P. Franzosi and M. Sauvage, Il Nuovo Cimento 19D, 537 (1997).
R.L. Forrest, J. Kulik, T.D. Golding, and S.C. Moss, J. Mater. Res. 15, 45 (2000).
S.R. Lee, B.L. Boyle, T.J. Drummond, J.W. Medernach, and R.P. Schneider, Adv. in X-ray Analysis Vol. 38, ed. P. Predecki (New York: Plenum, 1995), p. 201.
L.C. Su, I.H. Ho, and G.B. Stringfellow, J. Appl. Phys. 75, 5135 (1994).
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Hess, R.R., Moore, C.D., Forrest, R.L. et al. Reciprocal space mapping of ordered domains in InxGa1−xP. J. Electron. Mater. 29, 1063–1066 (2000). https://doi.org/10.1007/s11664-004-0265-9
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DOI: https://doi.org/10.1007/s11664-004-0265-9