Abstract
The annealing behavior of Ge native oxides has been studied with x-ray photoemission spectroscopy (XPS). The native oxides were primarily GeO2 with small amounts of GeOx (x<2). Annealing was performed using a rapid thermal processor (RTP) with a N2 purge at atmospheric pressure. Ion-implanted Ge substrates were used to investigate the loss of Ge from the surface due to thermal desorption of Ge oxides. It was found that thermal desorption of volatile Ge oxides and oxidization of Ge take place successively, which results in the loss of Ge from the surface.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
C. Chui, S. Ramanathan, B.B. Triplett, P.C. McIntyre, and K.C. Saraswat, IEEE Electron Dev. Lett. 23, 473 (2002).
T. Low, Y.T. Hou, M.F. Li, Z. Chunxiang, D.-L. Kwong, and A. Chin, Symp. VLSI Tech. Dig., p. 117 (2003).
S. Luryi, A. Kastalsky, and J.C. Bean, IEEE Trans. Electron Dev. ED-31, 1135 (1984).
L. Colace, G. Masini, G. Assanto, H.C. Luan, K. Wada, and L.C. Kimerling, Appl. Phys. Lett. 76, 1231 (2000).
J.L. Liu, S. Tong, Y.H. Luo, J. Wan, and K.L. Wang, Appl. Phys. Lett. 79, 3431 (2001).
J. Oh, J.C. Campbell, S.G. Thomas, S. Bharatan, R. Thoma, C. Jasper, R.E. Jones, and T.E. Zirkle, IEEE J. Quantum Electron 38, 1238 (2002).
N. Miyata, M. Shigeno, Y. Arimoto, and T. Ito, J. Appl. Phys. 74, 5275 (1993).
P.J. Grunthaner, M.H. Hecht, F.J. Grunthaner, and N.M. Johnson, J. Appl. Phys., 61, 629 (1987).
P. Morgen, U. Höfer, W. Wurth, and E. Umbach, Phys. Rev. B 39, 3720 (1989).
M. Liehr, J.E. Lewis, and G.W. Rubloff, J. Vac. Sci. Technol. A 5, 1559 (1987).
Y. Kobayashi, Y. Shinoda, and K. Sugii, Jpn. J. Appl. Phys. 29, 1004 (1990).
L. Surnev and M. Tikhov, Surf. Sci. 123, 505 (1982).
X.-J. Zhang, G. Xue, A. Agarwal, R. Tsu, M.-A. Hasan, J.E. Greene, and A. Rockett, J. Vac. Sci. Technol. 11, 2553 (1993).
K. Prabhakaran and T. Ogino, Surf. Sci. 325, 263 (1995).
K. Prabhakaran, F. Maeda, Y. Watanabe, and T. Ogino, Appl. Phys. Lett. 76, 2244 (2000).
D. Schmeisser, R.D. Schnell, A. Bogen, F.J. Himpsel, D. Rieger, G. Landgren, and J.F. Morar, Surf. Sci. 172, 455 (1986).
M.P. Seah and W.A. Dench, Surf. Interf. Anal. 1, 2 (1979).
CRC Handbook of Chemistry and Physics (Boca Raton, FL: CRC Press, 1993), pp. 4–61.
D.A. Hansen and J.B. Hudson, Surf. Sci. 292, 17 (1993).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Oh, J., Campbell, J.C. Thermal desorption of Ge native oxides and the loss of Ge from the surface. J. Electron. Mater. 33, 364–367 (2004). https://doi.org/10.1007/s11664-004-0144-4
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/s11664-004-0144-4